公开(公告)号：US20130323934A1

公开(公告)日：2013-12-05

申请号：US13989242

申请日：2011-10-12

申请人： Norio Wada ,  Takashi Terada ,  Yoshiteru Fukuda ,  Goro Furutani

发明人： Norio Wada ,  Takashi Terada ,  Yoshiteru Fukuda ,  Goro Furutani

IPC分类号： H01G9/20

CPC分类号： H01G9/20 ,  H01G9/2031 ,  H01G9/2059 ,  H01G9/2068 ,  Y02E10/542

摘要： [Problem] To significantly reduce processing time of a step of adsorbing dye in a porous semiconductor layer on a substrate surface.[Solution] A flow of a dye solution is formed in a gap between solution guide surface (92L, 92R) of a nozzle (20) and a substrate (G) during the treatment, and a porous semiconductor layer of a treated surface of the substrate is subject to dye adsorption treatment in this flow of the dye solution. Furthermore, impact pressure from slit-like discharge openings (88L, 88R) and pressure of turbulent flow in groove-like uneven sections (92L, 92R) act in the vertical direction in addition to the flow of the dye solution. Thus, aggregation and association of the dye are hardly caused on a surface part of the porous semiconductor layer of the treated surface of the substrate, the dye efficiently penetrates deeply into the porous semiconductor layer, and the dye adsorption into the porous semiconductor layer proceeds at high speed.

摘要翻译： [问题]为了显着减少在基板表面上的多孔半导体层中吸附染料的步骤的处理时间。 [解决方案]在处理期间，在喷嘴（20）的溶液引导表面（92L，92R）和基底（G）之间的间隙中形成染料溶液的流动，并且处理表面的多孔半导体层 在该染料溶液流中，对基材进行染料吸附处理。 此外，除了染料溶液的流动之外，狭缝状排出口（88L，88R）的冲击压力和槽状不均匀部分（92L，92R）中的湍流压力在垂直方向上起作用。 因此，在基板的处理表面的多孔半导体层的表面部分上几乎不引起染料的聚集和结合，染料有效地深入多孔半导体层，并且吸附到多孔半导体层中的染料进入 高速。

公开(公告)号：US09093222B2

公开(公告)日：2015-07-28

申请号：US13989151

申请日：2011-09-27

申请人： Goro Furutani ,  Takashi Terada ,  Yoshiteru Fukuda ,  Norio Wada

发明人： Goro Furutani ,  Takashi Terada ,  Yoshiteru Fukuda ,  Norio Wada

IPC分类号： B05C3/00 ,  H01G9/20 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01G9/20 ,  H01G9/2059 ,  H01L21/67057 ,  H01L21/67086 ,  H01L21/67757 ,  Y02E10/542 ,  Y02P70/521

摘要： Provided is a dye adsorption unit including a processing tank of which the upper surface is opened, in order to perform a batch dye adsorption process for a predetermined number of substrates. The dye adsorption unit further includes, as a moving system around the processing tank, a boat capable of going in and out of the processing tank from the upper opening, a boat transport unit that serves for the boat to go in and out of the processing tank, and a top cover for detachably closing the upper opening. Further, the dye adsorption unit includes a dye solution supply unit for supplying the dye solution into the processing tank, and a flow control unit for controlling the flow of the dye solution in the processing tank during the dye adsorption processing.

摘要翻译： 提供了一种染料吸附单元，其包括上表面打开的处理槽，以便对预定数量的基材进行分批染料吸附处理。 染料吸附单元还包括作为围绕处理罐的移动系统的能够从上部开口进出处理槽的船，用于船进出加工的船运输单元 罐和顶盖，用于可拆卸地封闭上部开口。 此外，染料吸附单元包括用于将染料溶液供给到处理槽中的染料溶液供给单元和用于在染料吸附处理期间控制处理槽中的染料溶液的流动的流量控制单元。

公开(公告)号：US20130316485A1

公开(公告)日：2013-11-28

申请号：US13989151

申请日：2011-09-27

申请人： Goro Furutani ,  Takashi Terada ,  Yoshiteru Fukuda ,  Norio Wada

发明人： Goro Furutani ,  Takashi Terada ,  Yoshiteru Fukuda ,  Norio Wada

IPC分类号： H01G9/20

CPC分类号： H01G9/20 ,  H01G9/2059 ,  H01L21/67057 ,  H01L21/67086 ,  H01L21/67757 ,  Y02E10/542 ,  Y02P70/521

摘要： [Problem] To significantly reduce the processing time of a step in which a coloring matter is adsorbed onto a porous semiconductor layer formed on the surface to be treated of a substrate.[Solution] A dye adsorption unit (20) includes a processing tank (30) of which the upper surface is opened, in order to perform a batch dye adsorption process for a predetermined number of substrates (G). The dye adsorption unit (20) further includes, as a moving system around the processing tank (30), a boat (32) capable of going in and out of the processing tank (30) from the upper opening, a boat transport unit (34) that serves for the boat (32) to go in and out of the processing tank (30), and a top cover (36) for detachably closing the upper opening. Further, the dye adsorption unit (20) includes a dye solution supply unit for supplying the dye solution into the processing tank (30), and a flow control unit for controlling the flow of the dye solution in the processing tank during the dye adsorption processing.

摘要翻译： [问题]为了显着地减少着色物质吸收到形成在待处理基材表面上的多孔半导体层上的步骤的处理时间。 [解决方案]染料吸附单元（20）包括打开上表面的处理槽（30），以对预定数量的基板（G）进行间染染色吸附处理。 染料吸附单元（20）还包括作为围绕处理罐（30）的移动系统的能够从上开口进出处理罐（30）的船（32），船运输单元 34），用于使船（32）进出处理罐（30），以及用于可拆卸地封闭上部开口的顶盖（36）。 此外，染料吸附单元（20）包括用于将染料溶液供给到处理槽（30）中的染料溶液供给单元和用于在染料吸附处理期间控制处理槽中的染料溶液的流动的流量控制单元 。

公开(公告)号：US20140134776A1

公开(公告)日：2014-05-15

申请号：US14129145

申请日：2012-04-24

申请人： Goro Furutani

发明人： Goro Furutani

IPC分类号： H01G9/00

CPC分类号： H01G9/0029 ,  H01G9/2031 ,  H01G9/2059 ,  Y02E10/542

摘要： The purpose of the present invention is to improve the throughput of a dye adsorption process in which a dye is adsorbed in a porous semiconductor layer on a substrate and to improve dye use efficiency. In a dye adsorption device of the present invention, a dye solution drop-coating unit 12 performs a first process (dye solution drop-coating process) on an unprocessed substrate G carried in the dye adsorption device 10, in which a dye solution is dropped and coated on a porous semiconductor layer on the substrate G. A solvent evaporating/removing unit 14 performs a second process (solvent removing process) in which a solvent is evaporated and removed from the dye solution coated on the semiconductor layer on the substrate G. A rinsing unit 16 performs a third process (rinsing process) in which unnecessary or extra dye attached to the surface of the semiconductor layer n the substrate G is rinsed and removed.

摘要翻译： 本发明的目的是提高染料吸附过程的染料吸附过程，其中染料吸附在基底上的多孔半导体层中并提高染料的使用效率。 在本发明的染料吸附装置中，染料溶液滴涂单元12对染色剂吸附装置10中携带的未处理基板G进行第一处理（染料溶液滴涂法），染色液滴下 并涂布在基板G上的多孔半导体层上。溶剂蒸发/去除单元14执行其中溶剂从涂覆在基板G上的半导体层上的染料溶液中蒸发除去的第二工序（溶剂除去工艺）。 冲洗单元16执行第三处理（漂洗处理），其中漂洗和去除附着在衬底G上的半导体层表面的不需要的或额外的染料。