Thin film coating system and method
    1.
    发明授权
    Thin film coating system and method 有权
    薄膜涂层系统及方法

    公开(公告)号:US08133361B2

    公开(公告)日:2012-03-13

    申请号:US12289398

    申请日:2008-10-27

    IPC分类号: C23C14/34 C23C14/35

    摘要: A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.

    摘要翻译: 一种用于在衬底上沉积薄膜的方法和系统。 在该系统中,靶材料沉积并在衬底表面上反应以形成基本上不吸收的薄膜。 每单位时间形成的非吸收性薄膜的体积可以通过将表面的面积增加×倍而增加,并且将目标材料的沉积速率提高大于该因子的倒数的因子 “x”,从而增加每单位时间内非吸收薄膜体积的形成速率。

    Thin film coating system and method
    2.
    发明申请
    Thin film coating system and method 有权
    薄膜涂层系统及方法

    公开(公告)号:US20090145745A1

    公开(公告)日:2009-06-11

    申请号:US12289398

    申请日:2008-10-27

    IPC分类号: C23C14/34

    摘要: A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.

    摘要翻译: 一种用于在衬底上沉积薄膜的方法和系统。 在该系统中,靶材料沉积并在衬底表面上反应以形成基本上不吸收的薄膜。 每单位时间形成的非吸收性薄膜的体积可以通过将表面的面积增加×倍而增加,并且将目标材料的沉积速率提高大于该因子的倒数的因子 “x”,从而增加每单位时间内非吸收薄膜体积的形成速率。