公开(公告)号：US08941832B2

公开(公告)日：2015-01-27

申请号：US13747937

申请日：2013-01-23

Applicant: Nova Measuring Instruments Ltd.

Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

IPC: G01B11/00 ,  H01L23/544 ,  H01L21/76 ,  G01B11/27 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US09310192B2

公开(公告)日：2016-04-12

申请号：US14594627

申请日：2015-01-12

Applicant: Nova Measuring Instruments Ltd.

Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

IPC: G01B11/27 ,  G01B11/14 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.