公开(公告)号：US10167425B2

公开(公告)日：2019-01-01

申请号：US15584208

申请日：2017-05-02

Applicant: OCI COMPANY LTD.

Inventor： Hoseong Yoo ,  Seunghyun Han ,  Wook Chang ,  Yongil Kim

IPC: C09K13/08 ,  C07C69/34 ,  C07C69/02 ,  H01L21/02 ,  C08K5/54 ,  C01B7/19

Abstract: The present disclosure relates to an etching solution capable of suppressing particle appearance including a first silane compound in which three or more hydrophilic functional groups are independently bonded to a silicon atom and a second silane compound in which one or two hydrophilic functional groups are independently bonded to a silicon atom.

公开(公告)号：US20170321121A1

公开(公告)日：2017-11-09

申请号：US15584208

申请日：2017-05-02

Applicant: OCI COMPANY LTD.

Inventor： Hoseong Yoo ,  Seunghyun Han ,  Wook Chang ,  Yongil Kim

IPC: C09K13/08 ,  C07C69/34 ,  C01B7/19 ,  C07C69/02 ,  H01L21/02 ,  C08K5/54

CPC classification number: C09K13/08 ,  C01B7/19 ,  C08K5/54 ,  H01L21/0206 ,  H01L21/31111

Abstract: The present disclosure relates to an etching solution capable of suppressing particle appearance including a first silane compound in which three or more hydrophilic functional groups are independently bonded to a silicon atom and a second silane compound in which one or two hydrophilic functional groups are independently bonded to a silicon atom. n