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公开(公告)号：US20210363625A1
公开(公告)日：2021-11-25
申请号：US16315718
申请日：2018-01-23
发明人： Jian Zhang , Chunchieh Huang , Zhiming Lin , Xinjian Zhang , Qi Wang , Zhiyuan Hao , De Zhang , Dejian Liu , Zhen Wang , Pu Sun
摘要： A mask strip, comprising: a plurality of mask units (2) in a first direction; each of the mask units (2) comprising a mask region (3) and a non-mask region (11) surrounding the mask region (3), the non-mask region (11) comprising a side region (4) and an original stress concentration region (6) inside the side region (4); each of the mask units (2) further comprising a stress concentration structure, wherein the stress concentration structure is within a part of the side region (4) other than the original stress concentration region (6). Also discloses a mask plate and a method of fabricating a mask strip.
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公开(公告)号：US10961616B2
公开(公告)日：2021-03-30
申请号：US16301650
申请日：2018-01-05
发明人： Zhiming Lin , Baojun Li , Jian Zhang , Pu Sun , Chun Chieh Huang
摘要： This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
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公开(公告)号：US20190177831A1
公开(公告)日：2019-06-13
申请号：US16301650
申请日：2018-01-05
发明人： Zhiming Lin , Baojun Li , Jian Zhang , Pu Sun , Chun Chieh Huang
摘要： This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same so as to improve the positional precision of opening areas of the mask to thereby further improve the precision of the mask. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
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