Method For Supplying A Process With An Enriched Carrier Gas
    1.
    发明申请
    Method For Supplying A Process With An Enriched Carrier Gas 有权
    为富含载气提供工艺的方法

    公开(公告)号:US20160017489A1

    公开(公告)日:2016-01-21

    申请号:US14772679

    申请日:2014-03-28

    CPC classification number: C23C16/4482 B01D1/14 C23C16/18 C23C16/4481 C23C16/52

    Abstract: A method for supplying a process with an enriched carrier gas. A first apparatus and a second apparatus are provided. The first apparatus has a precursor and is configured to bring a carrier gas into contact with the precursor and to enrich the carrier gas with the precursor. The second apparatus has a precursor and is configured to bring a carrier gas into contact with the precursor and to enrich the carrier gas with the precursor. The first apparatus supplies the second apparatus with an enriched carrier gas. The second apparatus supplies the enriched carrier gas for the process. A temperature of the first apparatus is controlled as a function of a quantity of precursor in the second apparatus.

    Abstract translation: 一种用于向富含载体气体提供过程的方法。 提供第一装置和第二装置。 第一装置具有前体并且构造成使载气与前体接触并且与前体富集载气。 第二装置具有前体并且构造成使载气与前体接触并且使前体富集载气。 第一装置向第二装置提供富集的载气。 第二装置提供用于该过程的富集的载气。 第一装置的温度作为第二装置中的前体的量的函数被控制。

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