公开(公告)号：US20040004301A1

公开(公告)日：2004-01-08

申请号：US10189620

申请日：2002-07-03

Applicant: OSRAM SYLVANIA Inc.

Inventor： Raj P. Singh ,  David L. Houck ,  Nelson E. Kopatz ,  Michael R. Pierce ,  Scott A. Braymiller

IPC: B29B009/00

CPC classification number: C30B29/06 ,  C01B33/02 ,  C30B15/00

Abstract: A method for spheridizing silicon metal particles is described. The method involves injecting irregular silicon metal particles into a high-temperature plasma reactor to melt at least 50 weight percent of the particles. The molten droplets are solidified to form substantially spherical silicon particles having a thin SiO coating which may be removed by treating with a weak hydroxide solution.