Process for applying phosphor particles to a dielectric layer of a gaseous discharge device
    1.
    发明授权
    Process for applying phosphor particles to a dielectric layer of a gaseous discharge device 失效
    将磷化物颗粒施加到气体放电装置的介电层的方法

    公开(公告)号:US3701658A

    公开(公告)日:1972-10-31

    申请号:US3701658D

    申请日:1970-12-24

    Inventor: CLARK ROBERT N

    CPC classification number: H01J11/00 C09K11/02

    Abstract: THERE IS DISCLOSED A PROCESS FOR EMBEDDING PHOSPHOR PARTICLES IN THE SURFACE OF AT LEAST ONE DIELECTRIC MEMBER TO BE ASSEMBLED IN A MULTIPLE GASEOUS DISCHARGE DISPLAY/ MEMORY PANEL SUCH THAT THE PHOSPHOR PARTICLES ARE PARTIALLY EXPOSED TO THE GASEOUS MEDIUM OF THE ASSEMBLED PANEL AND ARE CAPABLE OF BEING EXCITED BY RADIATION FROM THE GASEOUS DISCHARGES OF SUCH ASSEMBLED PANEL. ANY SUITABLE LUMINESCENT PHOSPHOR WHICH IS COMPATIBLE WITH THE DIELECTRIC MAY BE USED; HOWEVER, PHOTOLUMINESCENT PHOSPHORS ARE HIGHLY PREFERRED. ONE EMBODIMENT COMPRISES PARTIALLY EMBEDDING THE PHOSPHOR PARTICLES BY MEANS OF A PHOTOSENSITIVE MATERIAL.

Patent Agency Ranking