公开(公告)号：US11001932B2

公开(公告)日：2021-05-11

申请号：US15546343

申请日：2016-01-26

Applicant: Outokumpu Oyj

Inventor： Jan-Olof Maxe ,  Peter Bamforth ,  Timo Piitulainen ,  Sara Randström ,  Henrik Ahrman ,  Lennart Johansson

IPC: C25C7/02 ,  C25C1/08 ,  C25C1/12 ,  C25C1/20 ,  C25C7/08 ,  B24C1/06 ,  B21B1/22 ,  B24C1/10 ,  C22C38/00 ,  C22C38/04 ,  C22C38/42 ,  C22C38/44 ,  C23F1/00

Abstract: The invention relates to a method for manufacturing a plate material which is used in the electrochemical process of metal as a part of a cathode on which surface a metal is deposited. The surface roughness of the plate material for the adhesion between the metal deposit and the plate material is achieved with at least one treatment in a coil processing line.

公开(公告)号：US20180038005A1

公开(公告)日：2018-02-08

申请号：US15546343

申请日：2016-01-26

Applicant: Outokumpu Oyj

Inventor： Jan-Olof Maxe ,  Peter Bamforth ,  Timo Piitulainen ,  Sara Randström ,  Henrik Ahrman ,  Lennart Johansson

IPC: C25C7/02 ,  C22C38/04 ,  C22C38/00 ,  C22C38/42 ,  B21B1/22 ,  C25C1/20 ,  C25C1/08 ,  C25C7/08 ,  B24C1/10 ,  C22C38/44 ,  C25C1/12

CPC classification number: C25C7/02 ,  B21B1/22 ,  B21B2001/221 ,  B24C1/06 ,  B24C1/10 ,  C22C38/001 ,  C22C38/04 ,  C22C38/42 ,  C22C38/44 ,  C23F1/00 ,  C25C1/08 ,  C25C1/12 ,  C25C1/20 ,  C25C7/08

Abstract: The invention relates to a method for manufacturing a plate material which is used in the electrochemical process of metal as a part of a cathode on which surface a metal is deposited. The surface roughness of the plate material for the adhesion between the metal deposit and the plate material is achieved with at least one treatment in a coil processing line.