公开(公告)号：US20190119526A1

公开(公告)日：2019-04-25

申请号：US16093061

申请日：2017-09-22

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Haruka NISHIKAWA ,  Toshiyuki IEDA ,  Atsushi NAGAI ,  Kazuya SHIMADA

IPC: C09G1/04 ,  C03C15/00

Abstract: An occurrence of a dimple during glass polishing is suppressed by scraping a fine scratch that will become the dimple to be grown in a pre-polishing, followed by main polishing. However, at a mark of the dimple in which the growth thereof is suppressed in the pre-polishing, fine roughening of a surface is generated. Further, a polishing liquid containing hydrofluoric acid, an alkali metal, water, and a surfactant that is a sulfonic acid-type or sulfate-type surfactant can suppress excess crystal growth of a deposit formed in a fine scratch in pre-polishing and suppress roughening of a surface after polishing.

公开(公告)号：US20180362897A1

公开(公告)日：2018-12-20

申请号：US15781421

申请日：2015-06-16

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Haruka NISHIKAWA ,  Toshiyuki IEDA ,  Kazuya SHIMADA

IPC: C11D7/10 ,  B08B9/08 ,  B08B9/027 ,  B08B3/08 ,  C11D17/08

Abstract: When an alkali-free glass is polished with a polishing liquid containing hydrofluoric acid as a main component, a sludge is generated on a glass surface and in a storage unit and a pipe of a polishing device. As a result, there arise problems such as deterioration of quality and stopping of the device. A washing liquid that dissolves a sludge containing aluminum and fluorine produced in a glass polishing device is characterized by containing Al3+ ions, and a sludge formed by bonding a divalent element such as Mg, Ca, Sr, and Ba with Al and F can be dissolved with this washing liquid. The problems are solved by washing the inside of the polishing device with this washing liquid.