公开(公告)号：US11948824B2

公开(公告)日：2024-04-02

申请号：US18144471

申请日：2023-05-08

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: G03F1/64 ,  G03F7/00 ,  H01L21/68 ,  H01L21/687 ,  B32B38/10 ,  G03F1/62 ,  G03F1/82 ,  H01L21/683

CPC classification number: H01L21/68 ,  H01L21/682 ,  H01L21/68742 ,  B32B38/10 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70983 ,  H01L21/683 ,  Y10T156/1168

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US20240242996A1

公开(公告)日：2024-07-18

申请号：US18423816

申请日：2024-01-26

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: H01L21/68 ,  H01L21/687 ,  B32B38/10 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/00 ,  H01L21/683

CPC classification number: H01L21/68 ,  H01L21/682 ,  H01L21/68742 ,  B32B38/10 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70983 ,  H01L21/683 ,  Y10T156/1168

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US20210384057A1

公开(公告)日：2021-12-09

申请号：US17390018

申请日：2021-07-30

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: H01L21/68 ,  H01L21/687

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US20230274965A1

公开(公告)日：2023-08-31

申请号：US18144471

申请日：2023-05-08

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: H01L21/68 ,  H01L21/687

CPC classification number: H01L21/68 ,  H01L21/682 ,  H01L21/68742 ,  G03F7/70983

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US11682573B2

公开(公告)日：2023-06-20

申请号：US17390018

申请日：2021-07-30

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: G03F1/64 ,  G03F7/20 ,  H01L21/68 ,  H01L21/687 ,  G03F7/00 ,  G03F1/82 ,  H01L21/683 ,  G03F1/62 ,  B32B38/10

CPC classification number: H01L21/68 ,  H01L21/682 ,  H01L21/68742 ,  B32B38/10 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70983 ,  H01L21/683 ,  Y10T156/1168

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US11183410B2

公开(公告)日：2021-11-23

申请号：US15960963

申请日：2018-04-24

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: G03F1/64 ,  G03F7/20 ,  G03F1/62 ,  H01L21/68 ,  H01L21/687 ,  G03F1/82 ,  H01L21/683 ,  B32B38/10

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

公开(公告)号：US20180307133A1

公开(公告)日：2018-10-25

申请号：US15960963

申请日：2018-04-24

Applicant: PHOTRONICS, INC.

Inventor： Hilario Ar-Miguel Alvarez ,  Spencer Allen Mullens ,  Jesse Eugene Williams, II

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.