公开(公告)号：US20140118360A1

公开(公告)日：2014-05-01

申请号：US13664276

申请日：2012-10-30

Applicant: PIXTRONIX, INC.

Inventor： Jian J. Ma ,  John H. Hong ,  Tallis Y. Chang ,  Chong U. Lee

IPC: H01L33/60 ,  H01L33/08

CPC classification number: H01L33/60 ,  G02B5/22 ,  G02B26/001 ,  H01L33/08

Abstract: This disclosure provides systems, methods and apparatus for absorption film stacks. In one aspect, the absorption film stack is an interferometric absorption film stack that, for a selected wavelength of light, reduces light reflected from a surface of the stack by setting up a standing wave within the stack of materials. In some implementations, an absorbing layer may be placed at the peak of the standing wave interference pattern. The absorbing layer can be implemented to absorb selected wavelengths of light and substantially reduce the amount of unwanted reflections. In some other implementations, a reflective surface may be formed on the surface of the stack opposite the absorbing layer.

Abstract translation: 本公开提供了用于吸收膜堆叠的系统，方法和装置。 在一个方面，吸收膜堆叠是干涉式吸收膜堆叠，对于所选择的波长的光，通过在堆叠的材料内设置驻波来减少从堆叠的表面反射的光。 在一些实施方案中，吸收层可以放置在驻波干涉图案的峰值处。 可以实现吸收层以吸收所选择的波长的光并且显着减少不需要的反射的量。 在一些其它实施方案中，可以在与吸收层相对的堆叠的表面上形成反射表面。