公开(公告)号：US20250147212A1

公开(公告)日：2025-05-08

申请号：US18935003

申请日：2024-11-01

Applicant: POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION

Inventor： Jun Hwa SEONG ,  Jun Suk RHO ,  Trevon James BADLOE

IPC: G02B5/30 ,  B82Y20/00 ,  G02B1/00 ,  G02B27/00

Abstract: According to an embodiment of present disclosure, there is provided a metalens formed with a plurality of meta-atoms on one surface, including: a first co-polarization channel through which left-handed circular polarization (LCP) incident light exits as left-handed circular polarization (LCP) light, a second co-polarization channel through which right-handed circular polarization (RCP) incident light exits as right-handed circular polarization (RCP) light, a first cross-polarization channel through which left-handed circular polarization (LCP) incident light exits as right-handed circular polarization (RCP) light, and a second cross-polarization channel through which right-handed circular polarization (RCP) incident light exits as left-handed circular polarization (LCP) light, wherein first exit light exiting through the first co-polarization channel and the second co-polarization channel, second exit light exiting through the first cross-polarization channel, and third exit light exiting through the second cross-polarization channel are different in optical characteristics.

公开(公告)号：US20250123554A1

公开(公告)日：2025-04-17

申请号：US18763294

申请日：2024-07-03

Applicant: POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION ,  KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION

Inventor： Jun Suk RHO ,  Chi Hun LEE ,  Seok Woo JEON ,  Gwang Min BAE ,  Gun Ho CHANG

IPC: G03F1/70 ,  G03F7/00

Abstract: A mask design device for 3D proximity field pattering based on electric field control is provided. The mask design service, for producing a nanostructure having a constant period, may include: a material selector configured to select a material of the nanostructure having a specific refractive index; an objective function executor configured to execute an objective function based on a 2D electric field intensity map of the nanostructure formed from the material having a specific height and width; and an optimizer configured to set at least one of a period, the refractive index of the nanostructure, and the objective function, as an input variable, and configured to input the input variable into a predetermined algorithm to calculate design parameters of the nanostructure. A mask having the nanostructure, a method for manufacturing the mask, and a nano patterning device are also provided.