公开(公告)号：US20240105430A1

公开(公告)日：2024-03-28

申请号：US17766373

申请日：2020-10-01

Applicant: PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.

Inventor： Qihao YU ,  Erik LEMMEN ,  Bastiaan Joannes Daniël VERMULST

IPC: H01J37/32 ,  G01R19/00 ,  H01L21/02

CPC classification number: H01J37/32917 ,  G01R19/0046 ,  H01L21/02 ,  H01J2237/24564

Abstract: An ion energy for plasma processing of a dielectric substrate is determined by exposing the dielectric substrate to a plasma discharge and applying a pulsed voltage waveform. This waveform includes a sequence of pulses, each having a higher voltage interval and a lower voltage interval having a voltage slope. First pulses of the sequence having differing voltage slopes are generated and applied to the dielectric substrate. For each first pulse, the voltage slope and a corresponding output current are determined. For each first pulse, at least one coefficient of a mathematical relation between the voltage slope and the corresponding output current based solely on the voltage slope and the output current determined for one or more of the first pulses is determined. A test function is applied and an optimal voltage slope value corresponding to the at least one coefficient making the test function true is selected.