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公开(公告)号：US20200211871A1
公开(公告)日：2020-07-02
申请号：US16557707
申请日：2019-08-30
Applicant: PSK INC. , PSK Holdings Inc.
Inventor： Je Hyeok RYU , Jae Kyeong YOO , Jung-Hyun KANG
IPC: H01L21/67 , H01L21/687
Abstract: Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.
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