公开(公告)号：US20220030707A1

公开(公告)日：2022-01-27

申请号：US17357159

申请日：2021-06-24

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： NORIMICHI NOGUCHI ,  MASATERU MIKAMI ,  KENJI TOYOSHIMA ,  HIROKI ODA ,  DAISUKE SUETSUGU ,  TATSUYA URAKAWA

IPC: H05K1/03 ,  H01C1/14 ,  H01C7/18 ,  H01C17/00 ,  H05K1/16 ,  B32B18/00 ,  C04B35/624 ,  C04B35/44

Abstract: A laminated ceramic sintered body board for an electronic device includes a ceramic sintered body board and a flattening film that is provided on an upper surface of the ceramic sintered body board and contains a thermally conductive filler, and the flattening film contains a thermally conductive filler.

公开(公告)号：US20220028586A1

公开(公告)日：2022-01-27

申请号：US17354895

申请日：2021-06-22

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： MASATERU MIKAMI ,  DAISUKE SUETSUGU ,  NORIMICHI NOGUCHI

IPC: H01C1/01 ,  H01C7/00

Abstract: The laminated alumina board for an electronic device includes an alumina board that is made of a sintered body of alumina particles and has an unevenness structure that is formed of the alumina particles on a surface and a flattening film that is provided on an upper surface of the alumina board and contains alumina as a main component.

公开(公告)号：US20220005680A1

公开(公告)日：2022-01-06

申请号：US17354920

申请日：2021-06-22

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： DAISUKE SUETSUGU ,  NORIMICHI NOGUCHI

IPC: H01J37/34 ,  C23C14/54 ,  C23C14/35

Abstract: A sputtering device includes: a vacuum chamber in which a target material and a substrate are disposable in a manner of facing each other; a DC power supply being electrically connectable to the target material; a gas supply source configured to introduce a film forming gas containing a nitrogen gas into the vacuum chamber; and a pulsing unit configured to pulse a current flowing from the DC power supply to the target material. The sputtering device forms a nitride thin film having a ternary or more composition containing nitrogen on the substrate by generating plasma in the vacuum chamber using a sintered alloy target material having a binary or more composition as the target material.

公开(公告)号：US20220003706A1

公开(公告)日：2022-01-06

申请号：US17354925

申请日：2021-06-22

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： SHINYA SUZUKI ,  KIYOKAZU ITOI ,  DAISUKE SUETSUGU ,  NORIMICHI NOGUCHI ,  NOBUTOSHI TAKAGI

IPC: G01N27/12 ,  G01N33/00

Abstract: A gas sensor device includes: a first electrode; a second electrode; a metal oxide layer that is disposed between the first electrode and the second electrode and is in contact with the first electrode and the second electrode; an interlayer insulating film that covers a part of the first electrode, a part of the second electrode, and a part of the metal oxide layer; and a hydrogen permeable film that allows only hydrogen to permeate, a local region that is in contact with the second electrode is provided inside the metal oxide layer, the local region having a higher oxygen deficiency than an oxygen deficiency of the other region in the metal oxide layer, an opening that exposes a gas contact portion which is a part of a main surface of the second electrode is provided in the interlayer insulating film, and the hydrogen permeable film is provided to cover at least the gas contact portion.