Phosphorus effusion source
    1.
    发明授权
    Phosphorus effusion source 失效
    磷水源

    公开(公告)号:US6030458A

    公开(公告)日:2000-02-29

    申请号:US887554

    申请日:1997-07-03

    IPC分类号: C23C14/24 C30B23/06 C23C14/00

    CPC分类号: C23C14/243 C30B23/066

    摘要: This invention is a sublimating and cracking apparatus for producing a beam of molecules to be deposited on a substrate, and an apparatus which is particularly useful with phosphorus as the source material. In the phosphorus effusion cell of this invention, a vacuum jacket encloses and supports a red phosphorus crucible, a condensing crucible for white phosphorus and a connecting tube within a vacuum space. In use, red phosphorus is first transformed and deposited as white phosphorus in the condensing chamber. The white phosphorus is then directed to a cracker section where it is cracked and subsequently directed to the substrate.

    摘要翻译: 本发明是一种用于生产待沉积在基底上的分子束的升华和裂解装置,以及以磷为源材料特别有用的装置。 在本发明的磷积液电池中,真空夹套包围并支撑红磷坩埚,用于白磷的冷凝坩埚和真空空间内的连接管。 在使用中,红磷首先在冷凝室中以白磷转化和沉积。 然后将白磷指向裂化器部分,在那里它被破裂并随后导向基底。

    Crucible eliminating line of sight between a source material and a target
    2.
    发明申请
    Crucible eliminating line of sight between a source material and a target 审中-公开
    可消除源材料和目标物之间的视线

    公开(公告)号:US20070218199A1

    公开(公告)日:2007-09-20

    申请号:US11353708

    申请日:2006-02-13

    IPC分类号: C23C16/00

    CPC分类号: C30B23/066 C30B35/00

    摘要: A crucible for heating material to be deposited on a target substrate includes a body configured to contain source material, a base formed at a first end of the body, and an emitting orifice formed at a second end of the body. The crucible further includes at least one intermediate orifice arranged and configured such that the heated source material passes through the intermediate orifice and impacts at least once upon the inner surface of the crucible body before passing through the emitting orifice.

    摘要翻译: 用于加热要沉积在靶基板上的材料的坩埚包括构造成容纳源材料的主体,形成在主体的第一端处的底座和形成在主体的第二端处的发射孔。 所述坩埚还包括至少一个中间孔口,其布置和构造成使得所述加热的源材料通过所述中间孔口,并且在通过所述排放孔口之前至少冲击所述坩埚体的内表面。