公开(公告)号：US20060021962A1

公开(公告)日：2006-02-02

申请号：US10902762

申请日：2004-07-30

申请人： Peter Hartwell ,  Uija Yoon

发明人： Peter Hartwell ,  Uija Yoon

IPC分类号： B44C1/22 ,  C23F1/00

CPC分类号： H01J9/025 ,  G01Q70/16 ,  G01Q80/00 ,  H01J2201/30407 ,  H01J2329/00

摘要： A method of fabricating a sharp protrusion on an underlayer is disclosed. A tip layer is deposited on an underlayer and then a mask layer is deposited on the tip layer. The mask layer is patterned with a beam-and-hat pattern that is used to form a beam-and-hat mask in the mask layer. Portions of the tip layer that are not covered by the beam-and-hat mask are isotropically etched to form a tip including a vertex. Beam portions of the beam-and-hat mask support the hat portion and prevent a release of the hat portion during the isotropic etching process. An anisotropic etch process can be used prior to the isotropic etching process to change a character of the tip. The underlayer can be patterned and etched to form a cantilever that includes the sharp protrusion extending outward of a surface of the cantilever.

公开(公告)号：US07118679B2

公开(公告)日：2006-10-10

申请号：US10902762

申请日：2004-07-30

申请人： Peter G. Hartwell ,  Uija Yoon

发明人： Peter G. Hartwell ,  Uija Yoon

IPC分类号： B44C1/22 ,  H01L21/00

CPC分类号： H01J9/025 ,  G01Q70/16 ,  G01Q80/00 ,  H01J2201/30407 ,  H01J2329/00

摘要： A method of fabricating a sharp protrusion on an underlayer is disclosed. A tip layer is deposited on an underlayer and then a mask layer is deposited on the tip layer. The mask layer is patterned with a beam-and-hat pattern that is used to form a beam-and-hat mask in the mask layer. Portions of the tip layer that are not covered by the beam-and-hat mask are isotropically etched to form a tip including a vertex. Beam portions of the beam-and-hat mask support the hat portion and prevent a release of the hat portion during the isotropic etching process. An anisotropic etch process can be used prior to the isotropic etching process to change a character of the tip. The underlayer can be patterned and etched to form a cantilever that includes the sharp protrusion extending outward of a surface of the cantilever.

摘要翻译： 公开了一种在底层上制造尖锐突起的方法。 尖端层沉积在底层上，然后掩模层沉积在尖端层上。 使用用于在掩模层中形成光束和帽子掩模的光束和帽子图案来对掩模层进行图案化。 尖端层的未被束帽掩模覆盖的部分被各向同性蚀刻以形成包括顶点的尖端。 梁和帽子面罩的梁部分支撑帽部分并且防止在各向同性蚀刻过程期间帽部分的释放。 在各向同性蚀刻工艺之前可以使用各向异性蚀刻工艺来改变尖端的特性。 底层可以被图案化和蚀刻以形成悬臂，其包括从悬臂的表面向外延伸的尖锐突起。