-
-
-
-
公开(公告)号:USD659182S1
公开(公告)日:2012-05-08
申请号:US29400739
申请日:2011-08-31
Applicant: Jae Shin , Colin Baden , Peter Yee
Designer: Jae Shin , Colin Baden , Peter Yee
-
-
公开(公告)号:USD676898S1
公开(公告)日:2013-02-26
申请号:US29410542
申请日:2012-01-09
Applicant: Jae Shin , Colin Baden , Peter Yee
Designer: Jae Shin , Colin Baden , Peter Yee
-
公开(公告)号:US09846285B2
公开(公告)日:2017-12-19
申请号:US13444635
申请日:2012-04-11
Applicant: Gregory Alan Fish , Jae Shin
Inventor: Gregory Alan Fish , Jae Shin
CPC classification number: G02B6/4203 , G02B6/1228 , G02B6/305 , G02B2006/12061 , G02B2006/12078
Abstract: Embodiments of the invention describe optical devices including a III-V slab having a taper including a first region and a second region smaller than the first. Said first region receives light and confines an optical mode of the received light; thus, as opposed to the prior art solutions, said III-V regions of optical devices perform the optical function of mode confinement. Embodiments of the invention further describe optical devices including a silicon slab to receive light from said III-V slab, and having a taper including a first silicon region and a second silicon region smaller than the first. Said first region receives light and confines an optical mode of the received light.Thus, embodiments of the invention describe optical devices created with a low loss transition from hybrid regions to silicon regions with fewer restrictions on the design of the silicon waveguides and the III-V waveguides.
-
-
-
公开(公告)号:US20050128398A1
公开(公告)日:2005-06-16
申请号:US11044301
申请日:2005-01-28
Applicant: Jeong Kim , Kyung Kang , Jo Jeong , Myung Nam , Jae Shin
Inventor: Jeong Kim , Kyung Kang , Jo Jeong , Myung Nam , Jae Shin
IPC: G02F1/13 , G02F1/1333 , G02F1/1337 , G02F1/136 , G03F1/00 , G03F9/00 , H01L21/027
CPC classification number: G02F1/133351
Abstract: A method for designing a mask and for fabricating a panel improves the efficiency with which a base substrate may be used by forming unit panels of different sizes on the base substrate. The mask includes a first region and a second region, a first mask pattern within the first region, and a second mask pattern within the second region.
Abstract translation: 用于设计掩模和制造面板的方法通过在基底基板上形成不同尺寸的单元面板来提高可以使用基底基板的效率。 掩模包括第一区域和第二区域,第一区域内的第一掩模图案和第二区域内的第二掩模图案。
-
-
-
-
-
-
-
-
-