Clamp disposed at edge of a dielectric structure in a semiconductor
device and method of forming same
    1.
    发明授权
    Clamp disposed at edge of a dielectric structure in a semiconductor device and method of forming same 失效
    设置在半导体器件中的电介质结构的边缘处的夹具及其形成方法

    公开(公告)号:US5804869A

    公开(公告)日:1998-09-08

    申请号:US829073

    申请日:1997-03-31

    IPC分类号: H01L23/00 H01L23/31 H01L23/58

    摘要: A semiconductor structure (10) uses a clamp (16) disposed at an edge (27) of a dielectric structure (14) in a semiconductor device. The clamp substantially reduces the separation or peeling of the dielectric structure or layer away from the underlying semiconductor material (20,24). The clamp also provides the benefit of protecting the interface between the dielectric layer and the underlying semiconductor material from chemical or moisture attack, either during later processing or after final manufacture. Such chemical or moisture attack and internal film stress are factors leading to separation of the dielectric film from the underlying semiconductor material. The clamp is useful, for example, in preventing separation of silicon nitride or oxide passivation from gallium arsenide substrates in power rectifier diodes.

    摘要翻译: 半导体结构(10)使用设置在半导体器件中的电介质结构(14)的边缘(27)处的夹具(16)。 夹具基本上减少了介质结构或层离开下面的半导体材料(20,24)的分离或剥离。 夹具还提供了保护介电层和下面的半导体材料之间的界面免受化学或水分侵蚀的好处,无论是在后期加工还是在最终制造之后。 这种化学或水分侵袭和内部薄膜应力是导致电介质膜与下面的半导体材料分离的因素。 夹具例如用于防止在功率整流二极管中分离氮化硅或氧化物钝化与砷化镓衬底。