摘要:
A semiconductor structure (10) uses a clamp (16) disposed at an edge (27) of a dielectric structure (14) in a semiconductor device. The clamp substantially reduces the separation or peeling of the dielectric structure or layer away from the underlying semiconductor material (20,24). The clamp also provides the benefit of protecting the interface between the dielectric layer and the underlying semiconductor material from chemical or moisture attack, either during later processing or after final manufacture. Such chemical or moisture attack and internal film stress are factors leading to separation of the dielectric film from the underlying semiconductor material. The clamp is useful, for example, in preventing separation of silicon nitride or oxide passivation from gallium arsenide substrates in power rectifier diodes.
摘要:
A semiconductor component includes a semiconductor layer (110) having a trench (326). The trench has first and second sides. A portion (713) of the semiconductor layer has a conductivity type and a charge density. The semiconductor component also includes a control electrode (540, 1240) in the trench. The semiconductor component further includes a channel region (120) in the semiconductor layer and adjacent to the trench. The semiconductor component still further includes a region (755) in the semiconductor layer. The region has a conductivity type different from that of the portion of the semiconductor layer. The region also has a charge density balancing the charge density of the portion of the semiconductor layer.
摘要:
A semiconductor component includes a semiconductor layer (110) having a trench (326). The trench has first and second sides. A portion (713) of the semiconductor layer has a conductivity type and a charge density. The semiconductor component also includes a control electrode (540, 1240) in the trench. The semiconductor component further includes a channel region (120) in the semiconductor layer and adjacent to the trench. The semiconductor component still further includes a region (755) in the semiconductor layer. The region has a conductivity type different from that of the portion of the semiconductor layer. The region also has a charge density balancing the charge density of the portion of the semiconductor layer.
摘要:
A semiconductor component includes a semiconductor layer (110) having a trench (326). The trench has first and second sides. A portion (713) of the semiconductor layer has a conductivity type and a charge density. The semiconductor component also includes a control electrode (540, 1240) in the trench. The semiconductor component further includes a channel region (120) in the semiconductor layer and adjacent to the trench. The semiconductor component still further includes a region (755) in the semiconductor layer. The region has a conductivity type different from that of the portion of the semiconductor layer. The region also has a charge density balancing the charge density of the portion of the semiconductor layer.
摘要:
A semiconductor component includes a semiconductor layer (110) having a trench (326). The trench has first and second sides. A portion (713) of the semiconductor layer has a conductivity type and a charge density. The semiconductor component also includes a control electrode (540, 1240) in the trench. The semiconductor component further includes a channel region (120) in the semiconductor layer and adjacent to the trench. The semiconductor component still further includes a region (755) in the semiconductor layer. The region has a conductivity type different from that of the portion of the semiconductor layer. The region also has a charge density balancing the charge density of the portion of the semiconductor layer.
摘要:
An edge termination structure is created by forming trench structures (14) near a PN junction. The presence of the trench structures (14) extends a depletion region (13) between a doped region (12) and a body of semiconductor material or a semiconductor substrate (11) of the opposite conductivity type away from the doped region (12). This in turn forces junction breakdown to occur in the semiconductor bulk, leading to enhancement of the breakdown voltage of a semiconductor device (10). A surface of the trench structures (14) is covered with a conductive layer (16) which keeps the surface of the trench structures (14) at an equal voltage potential. This creates an equipotential surface across each of the trench structures (14) and forces the depletion region to extend laterally along the surface of semiconductor substrate (11). The conductive layers (16) are electrically isolated from an electrical contact (17) which contacts the doped region (12) and from the conductive layers (16) of neighboring trench structures (14).
摘要:
A combination touch and transducer input system is provided, which facilitates user input into an electronic system with a finger and/or a transducer (e.g., a stylus). The system includes a transducer configured to generate an electric field, and a sensor including an array of electrodes and a controller. The transducer is configured to transmit digital data, such as pen pressure data and switch status data, to the sensor. For example, the transducer comprises electronic circuitry configured to encode the digital data in a signal for transmission to the sensor. The sensor controller is configured to operate both in a touch sensing mode and in a transducer sensing mode. During the touch sensing mode, the controller determines a position of a proximate object (e.g., a finger) by capacitively sensing the object with the array of electrodes. During the transducer sensing mode, the controller determines a position of the transducer based on a signal received by the array of electrodes from the transducer, and also receives and decodes the digital data encoded in the received signal. Digital data can be encoded in a signal using any suitable digital modulation techniques, such as a Frequency-Shift Keying (FSK) technique.
摘要:
In one embodiment, a method for fabricating a compound semiconductor vertical FET device includes forming a first trench in a body of semiconductor material, and forming a self-aligned second trench within the first trench to define a channel region. A doped gate region is then formed on the sidewalls and the bottom surface of the second trench. Source regions are formed on opposite sides of the trench structure. Localized gate contact regions couple individual doped gate regions together. Contacts are then formed to the localized gate contact regions, the source regions, and an opposing surface of the body of semiconductor material. The method provides a compound semiconductor vertical FET structure having enhanced blocking capability.
摘要:
An electronic device configured for transferring at least one on board application program to a second electronic device, includes a processor employing software for performing an analysis of real-time operating characteristics of the electronic device, including any anomalous operating characteristics, in relation to on board application programs in the electronic device. A communication link, coupled to the electronic device, is configured for transferring at least one onboard application program from the electronic device to the second electronic device. The transfer of the at least one onboard application program from the electronic device to the second electronic device proceeds only if the software employed by the processor validates that the at least one onboard application program in the electronic device is unlikely to degrade operating characteristics of the second electronic device.
摘要:
In one embodiment, a dc/dc converter network (71) is described. The converter network (71) includes at least one GaAs depletion mode or normally on FET device (711, 712). The converter network (71) is a two-port system having a positive input terminal (710), a positive output terminal (730), and a negative input terminal (720) connected to a negative output terminal (740). A first GaAs depletion mode FET (711) is connected between the positive input terminal (710) and an internal node (795). A second GaAs depletion mode FET (712) is connected between the internal node (795) and the common negative terminals (720, 740). A control circuit (780) is connected gate leads of the two FETs (711, 712), to alternatively switch the devices from a current conducting mode to a current blocking mode. An inductor (760) is connected between the internal node (795) and the positive output terminal (730). The GaAs depletion mode devices provide a converter network with improved performance.