Abstract:
Systems are provided for a frame of an optic element of a lighting system. In one example, a baffle frame including extended exterior sidewalls and inner angled walls extending below a bottom surface of the optic element may reduce light reflecting off a workpiece and escaping outside and interior of the baffle frame.
Abstract:
A system and method for monitoring and operating one or more light emitting devices is disclosed. In one example, light intensity within a dual elliptical reflecting chamber is sensed and operation of a fiber curing system is adjusted in response to an amount of sensed light energy.
Abstract:
A lighting device may comprise a light emitting element and a reflector, the reflector comprising: a first opening surrounding the light emitting element and a second opening; reflector side walls forming the first and second openings, the reflector side walls divergently extending from the first opening away from the light emitting element to the second opening; and corner facets, wherein each corner facet is positioned over a corresponding reflector corner formed by an adjacent pair of reflector side walls at the first opening. In this way, a photosensitive work piece may be uniformly irradiated while mitigating under-curing and over-curing, and while reducing a coupling optics size and a distance between the light emitting elements and the work piece, thereby decreasing cure times and lowering manufacturing costs.
Abstract:
A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises at least two UV light sources equally spaced around a central axis, each UV light source comprising a reflector and a cylindrical lens, and the UV curing device configured to receive a workpiece along the central axis. The reflectors are configured to substantially reduce the emitting angle of light from the UV light sources, thereby directing the light substantially through the cylindrical lenses, the cylindrical lenses focusing the light intensely along a surface of the workpiece.
Abstract:
A system and method for monitoring a fiber curing system is disclosed. In one example, transmittance of a curing tube is determined so that curing of a coating applied to a fiber may be more uniform.
Abstract:
Systems are provided for a frame of an optic element of a lighting system. In one example, a baffle frame including extended exterior sidewalls and inner angled walls extending below a bottom surface of the optic element may reduce light reflecting off a workpiece and escaping outside and interior of the baffle frame.
Abstract:
A curing device comprises a first elliptic cylindrical reflector and a second elliptic cylindrical reflector, the first elliptic cylindrical reflector and the second elliptic cylindrical reflector arranged to have a co-located focus, and a light source located at a second focus of the first elliptic cylindrical reflector, wherein light emitted from the light source is reflected to the co-located focus from the first elliptic cylindrical reflector and retro-reflected to the co-located focus from the second elliptic cylindrical reflector.
Abstract:
A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises at least two UV light sources equally spaced around a central axis, each UV light source comprising a reflector and a cylindrical lens, and the UV curing device configured to receive a workpiece along the central axis. The reflectors are configured to substantially reduce the emitting angle of light from the UV light sources, thereby directing the light substantially through the cylindrical lenses, the cylindrical lenses focusing the light intensely along a surface of the workpiece.
Abstract:
Methods and systems are provided for ultra-violet curing, and in particular, for ultra-violet curing of optical fiber surface coatings. In one example, a curing device includes a first elliptic cylindrical reflector, with a second elliptic cylindrical reflector housed within the first elliptic cylindrical reflector. The first elliptic cylindrical reflector and second elliptic cylindrical reflector have a co-located focus, and a workpiece to be cured by the curing device may be arranged at the co-located focus.
Abstract:
Systems are provided for a frame of an optic element of a lighting system. In one example, a baffle frame including extended exterior sidewalls and inner angled walls extending below a bottom surface of the optic element may reduce light reflecting off a workpiece and escaping outside and interior of the baffle frame.