公开(公告)号：US20240139871A1

公开(公告)日：2024-05-02

申请号：US18279483

申请日：2022-03-02

Applicant: RENDYR, INC.

Inventor： Kaelum HASLER ,  Martin ANGST ,  Hans STAHL

IPC: B23K26/142 ,  B23K26/38 ,  B23K26/70 ,  B23K26/00 ,  B23K26/06

CPC classification number: B23K26/142 ,  B23K26/38 ,  B23K26/703 ,  B23K26/0096 ,  B23K26/0648

Abstract: An apparatus or process supplies a controlled stream of gas in a laminar flow to provide a laser beam permeable barrier in a plane between laser material processing byproducts and a final laser focusing optical element to separate a contaminated environment and a clean environment without directing gas towards the processing point of the laser. The stream of gas may be directed towards a filter by a vacuum source such as a fan. The vacuum source may be sized to draw in more gas than the stream of gas.