SEMICONDUCTOR DEVICE
    3.
    发明公开

    公开(公告)号:US20230290879A1

    公开(公告)日:2023-09-14

    申请号:US18065091

    申请日:2022-12-13

    CPC classification number: H01L29/7815 H01L25/074 H01L29/407 H01L29/7813

    Abstract: A performance of a semiconductor device including a main MOSFET and a sensing MOSFET having a double-gate structure including a gate electrode and a field plate electrode inside a trench is improved. A main MOSFET including a gate electrode and a field plate electrode inside a second trench and a sensing MOSFET for electric-current detection including a gate electrode and a field plate electrode inside a fourth trench are surrounded by different termination rings, respectively.

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