TWO-TERMINAL NON-VOLATILE MEMRISTOR AND MEMORY

    公开(公告)号:US20190189628A1

    公开(公告)日:2019-06-20

    申请号:US16215900

    申请日:2018-12-11

    摘要: The present disclosure provides a vertical tunneling random access memory comprising: a first electrode disposed on a base substrate; a second electrode vertically spaced from the first electrode; a floating gate disposed between the first electrode and the second electrode and configured to charge or discharge charges; a tunneling insulating layer disposed between the first electrode and the floating gate; a barrier insulating layer disposed between the floating gate and the second electrode; a contact hole passing through the tunneling insulating layer and the barrier insulating layer for partially exposing the first electrode; a semiconductor pattern extending from the second electrode, along and on a portion of a side wall face defining the contact hole, to the first electrode such that one end of the semiconductor pattern is in contact with the first electrode and the other end of the pattern is in contact with the second electrode.