公开(公告)号：US20210025835A1

公开(公告)日：2021-01-28

申请号：US16932939

申请日：2020-07-20

Applicant: ROLLS-ROYCE plc

Inventor： Jacqueline GRIFFITHS ,  Scott DUFFERWIEL ,  Jonathan EYRE

IPC: G01N23/20

Abstract: A method of defining at least one scan parameter for an x-ray scan of a single crystal structure, the method comprising: determining a target orientation of the structure for the scan; and defining different non-zero levels of x-ray exposure for different parts of a scan area based on either or both of the target orientation and characteristics of the structure; and, defining the scan area so that substantially all x-rays of the scan are directed to the structure in the target orientation.