公开(公告)号：US5445191A

公开(公告)日：1995-08-29

申请号：US288857

申请日：1994-08-11

申请人： Randall L. Green ,  Robert A. Sauer ,  Gary P. Ford

发明人： Randall L. Green ,  Robert A. Sauer ,  Gary P. Ford

IPC分类号： F16L11/08

CPC分类号： F16L11/086 ,  B60T17/04 ,  Y10S138/01

摘要： An hydraulic brake hose such as for automotive applications is formed of an EPDM elastomer core tube and one or more additional tube layers, each formed of such terpolymer compounded without processing oils and one or more interlying reinforcing layers of nonwater-base adhesive coated polyvinyl alcohol fibers. The absence of water from the reinforcing fibers provides thennal stability to the reinforcing layers, and the absence of compounding oil from the EPDM terpolymers also provides high temperature properties for the hose.

摘要翻译： 用于汽车应用的液压制动软管由EPDM弹性体芯管和一个或多个另外的管层形成，每个管层由不含加工油的三元共聚物和非水基粘合剂涂覆的聚乙烯醇纤维的一个或多个相互补强层 。 来自增强纤维的水不存在对增强层的稳定性，并且不存在来自EPDM三元共聚物的复合油也为软管提供高温性能。

公开(公告)号：US06416385B2

公开(公告)日：2002-07-09

申请号：US09887951

申请日：2001-06-22

申请人： Edward T. Ferri, Jr. ,  Randall L. Green ,  Anil K. Pant

发明人： Edward T. Ferri, Jr. ,  Randall L. Green ,  Anil K. Pant

IPC分类号： B24B4900

CPC分类号： H01L21/31053 ,  B24B21/04 ,  B24B21/10 ,  B24B37/04 ,  B24B37/345 ,  B24B41/005

摘要： A system and method for planarizing a plurality of semiconductor wafers is provided. The method includes the steps of processing each wafer along the same process path using at least two polishing stations to each partially planarize the wafers. The system includes an improved process path exchanging a detachable wafer carrying head with spindles at each processing point and conveying the detached wafer carrying heads in a rotary index table between processing points. The system also provides for improved polishing accuracy using linear polishers having pneumatically adjustable belt tensioning and aligning capabilities.

公开(公告)号：US5632960A

公开(公告)日：1997-05-27

申请号：US554787

申请日：1995-11-07

申请人： Edward T. Ferri, Jr. ,  J. Tobin Geatz ,  Randall L. Green

发明人： Edward T. Ferri, Jr. ,  J. Tobin Geatz ,  Randall L. Green

IPC分类号： B01F15/04 ,  G05D11/13 ,  G05D9/00

CPC分类号： G05D11/138 ,  G05D11/133

摘要： A chemical mixing system for mixing ultra pure water and concentrated HF to a desired concentration within a qualification range. Batches of the mixed chemical are mixed in a relatively small mix vessel and transferred to a relatively large mix drum. The concentration of the chemical within the mix drum is measured by a concentration monitor. If the measured concentration of the chemical in the mix drum is within the qualification range, the batches of chemical in the mix vessel are mixed to the desired concentration. If the measured concentration of the chemical in the mix drum is below the qualification range, the batches of chemical in the mix vessel are mixed to a high concentration which is greater than the desired concentration. If the measured concentration of the chemical in the mix drum is above the qualification range, the batches of chemical in the mix vessel are mixed to a low concentration which is less than the desired concentration. Batch averaging is thereby performed to maintain the concentration of chemical in the mix drum within the desired qualification range.

摘要翻译： 用于将超纯水和浓缩HF混合至合格范围内所需浓度的化学混合系统。 将混合化学品的批料在相对小的混合容器中混合并转移到相对较大的混合鼓中。 混合鼓中化学品的浓度通过浓度监测器测量。 如果混合鼓中化学品的测量浓度在合格范围内，则将混合容器中的化学品批次混合至所需浓度。 如果混合桶中化学品的测量浓度低于限定范围，则将混合容器中的化学品批次混合至高于所需浓度的高浓度。 如果混合桶中化学品的测量浓度高于限定范围，则将混合容器中的化学品批次混合至低于所需浓度的低浓度。 从而进行批量平均以将混合鼓中的化学品浓度保持在所需的限定范围内。

公开(公告)号：US06336845B1

公开(公告)日：2002-01-08

申请号：US08968333

申请日：1997-11-12

申请人： Erik H. Engdahl ,  Edward T. Ferri, Jr. ,  Wilbur C. Krusell ,  Rahul Jairath ,  Randall L. Green ,  Anil Pant

发明人： Erik H. Engdahl ,  Edward T. Ferri, Jr. ,  Wilbur C. Krusell ,  Rahul Jairath ,  Randall L. Green ,  Anil Pant

IPC分类号： B24B722

CPC分类号： H01L21/31053 ,  B24B21/04 ,  B24B21/10 ,  B24B37/04 ,  B24B37/345 ,  B24B41/005

摘要： A system and method for planarizing a plurality of semiconductor wafers is provided. The method includes the steps of processing each wafer along the same process path using at least two polishing stations to each partially planarize the wafers. The system includes an improved process path exchanging a detachable wafer carrying head with spindles at each processing point and conveying the detached wafer carrying heads in a rotary index table between processing points. The system also provides for improved polishing accuracy using linear polishers having pneumatically adjustable belt tensioning and aligning capabilities.

摘要翻译： 提供了一种用于平坦化多个半导体晶片的系统和方法。 该方法包括以下步骤：使用至少两个抛光站沿着相同的处理路径处理每个晶片，以使晶片各自部分平坦化。 该系统包括改进的处理路径，在每个处理点处交换具有主轴的可拆卸晶片承载头并将处理点之间的旋转索引台中的分离的晶片承载头传送。 该系统还提供了使用具有气动可调节带张紧和对准能力的线性抛光机来提高抛光精度。

公开(公告)号：US5874049A

公开(公告)日：1999-02-23

申请号：US789335

申请日：1997-01-23

申请人： Edward T. Ferri, Jr. ,  J. Tobin Geatz ,  Randall L. Green

发明人： Edward T. Ferri, Jr. ,  J. Tobin Geatz ,  Randall L. Green

IPC分类号： B01F15/04 ,  G05D11/13

CPC分类号： G05D11/138 ,  G05D11/133

摘要： A chemical mixing system for mixing ingredients at desired concentrations concentration within a qualification range. Batches of the mixed chemical are mixed in a relatively small mix vessel and transferred to a relatively large mix drum. The concentration of the chemical within the mix drum is measured by a concentration monitor. If the measured concentration of the chemical in the mix drum is within the qualification range, the batches of chemical in the mix vessel are mixed to the desired concentration. If the measured concentration of the chemical in the mix drum is below the qualification range, the batches of chemical in the mix vessel are mixed to a high concentration which is greater than the desired concentration. If the measured concentration of the chemical in the mix drum is above the qualification range, the batches of chemical in the mix vessel are mixed to a low concentration which is less than the desired concentration. Batch averaging is thereby performed to maintain the concentration of chemical in the mix drum within the desired qualification range.

摘要翻译： 用于在合格范围内混合所需浓度浓度成分的化学混合系统。 将混合化学品的批料在相对小的混合容器中混合并转移到相对较大的混合鼓中。 混合鼓中化学品的浓度通过浓度监测器测量。 如果混合鼓中化学品的测量浓度在合格范围内，则将混合容器中的化学品批次混合至所需浓度。 如果混合桶中化学品的测量浓度低于限定范围，则将混合容器中的化学品批次混合至高于所需浓度的高浓度。 如果混合鼓中化学品的测量浓度高于限定范围，则将混合容器中的化学品批次混合至低于所需浓度的低浓度。 从而进行批量平均以将混合鼓中的化学品浓度保持在所需的限定范围内。