公开(公告)号：US11679369B2

公开(公告)日：2023-06-20

申请号：US16072774

申请日：2017-01-25

Applicant: Regents of the University of Minnesota

Inventor： Xiao Wu ,  Shaobo Deng ,  Jun Zhu

IPC: B01J19/08 ,  B01J8/04 ,  H05H1/24 ,  C10L1/02 ,  C07C67/02

CPC classification number: B01J19/088 ,  B01J8/0453 ,  B01J19/087 ,  C07C67/02 ,  C10L1/026 ,  H05H1/2406 ,  B01J2219/0803 ,  B01J2219/083 ,  B01J2219/0809 ,  B01J2219/0811 ,  B01J2219/0815 ,  B01J2219/0824 ,  B01J2219/0828 ,  B01J2219/0869 ,  B01J2219/0877 ,  B01J2219/0888 ,  B01J2219/0892 ,  B01J2219/0894 ,  H05H1/246 ,  H05H1/2443 ,  H05H2245/15

Abstract: A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.

公开(公告)号：US20190030509A1

公开(公告)日：2019-01-31

申请号：US16072774

申请日：2017-01-25

Applicant: Regents of the University of Minnesota

Inventor： Xiao Wu ,  Shaobo Deng ,  Jun Zhu

IPC: B01J19/08 ,  B01J8/04 ,  H05H1/24 ,  C07C67/02

Abstract: A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.