Acyl hydrazino thiourea derivatives as photographic nucleating agents
    3.
    发明授权
    Acyl hydrazino thiourea derivatives as photographic nucleating agents 失效
    酰基肼基硫脲衍生物作为照相成核剂

    公开(公告)号:US4031127A

    公开(公告)日:1977-06-21

    申请号:US700982

    申请日:1976-06-29

    CPC分类号: C07C335/20 G03C1/48561

    摘要: Photographic nucleating agents are disclosed of the formula ##STR1## wherein R is a hydrogen, phenyl, alkylphenyl, cyanophenyl, halophenyl, alkoxyphenyl, alkyl, cycloalkyl, haloalkyl, alkoxyalkyl or phenylalkyl substituent;R.sup.1 is a phenylene or alkyl, halo- or alkoxy substituted phenylene group;R.sup.2 is an alkyl, haloalkyl, alkoxyalkyl or phenylalkyl substituent having up to 18 carbon atoms; a cycloalkyl substituent; phenyl or naphthyl; an alkylphenyl, cyanophenyl, halophenyl or alkoxyphenyl substituent or ##STR2## R.sup.3 is hydrogen, benzyl, alkoxybenzyl, halobenzyl or alkylbenzyl; THE ALKYL MOIETIES, EXCEPT AS OTHERWISE NOTED, IN EACH INSTANCE INCLUDE FROM 1 TO 6 CARBON ATOMS; ANDThe cycloalkyl moieties have from 3 to 10 carbon atoms.

    摘要翻译: 公开了下式的化合物:其中R为氢,苯基,烷基苯基,氰基苯基,卤代苯基,烷氧基苯基,烷基,环烷基,卤代烷基,烷氧基烷基或苯基烷基取代基; R1是亚苯基或烷基,卤代或烷氧基取代的亚苯基; R2是具有至多18个碳原子的烷基,卤代烷基,烷氧基烷基或苯基烷基取代基; 环烷基取代基; 苯基或萘基; 烷基苯基,氰基苯基,卤代苯基或烷氧基苯基取代基或R 3是氢,苄基,烷氧基苄基,卤代苄基或烷基苄基; 除非另有说明,否则在1至6个碳原子的情况下,除了各种情况外,ALKYL MOIETIES 而循环乐团则有3到10个碳原子。

    Sensitizing dye for photographic materials
    4.
    发明授权
    Sensitizing dye for photographic materials 失效
    感光材料敏感染料

    公开(公告)号:US5135845A

    公开(公告)日:1992-08-04

    申请号:US506746

    申请日:1990-04-10

    IPC分类号: C09B23/00 C09B23/06 G03C1/18

    CPC分类号: C09B23/06 G03C1/18

    摘要: Sensitizing dyes for photographic materials are disclosed. The dyes have the formula: ##STR1## Z.sub.1 represents the atoms necessary to complete a benzoxazole nucleus, a benzothiazole nucleus, a benzoselenazole nucleus, a benzotellurazole nucleus, or a benzimidazole nucleus, which, in addition to being substituted by R.sub.3, may be further substituted or unsubstituted,Z.sub.2 represents the atoms necessary to complete a benzoxazole nucleus, a benzothiazole nucleus, a benzoselenazole nucleus, a benzotellurazole nucleus, or a benzimidazole nucleus, which, in addition to being substituted by F, may be further substituted or unsubstituted,R represents H or substituted or unsubstituted alkyl or aryl,R.sub.1 and R.sub.2 each independently represents substituted or unsubstituted alkyl or aryl,R.sub.3 represents an aryl group that may be appended to or fused with Z.sub.1, andX is a counterion as needed to balance the charge of the molecule.

    White light handleable negative-acting silver halide photographic
elements
    6.
    发明授权
    White light handleable negative-acting silver halide photographic elements 失效
    白光可处理的负性卤化银照相元件

    公开(公告)号:US5213954A

    公开(公告)日:1993-05-25

    申请号:US615080

    申请日:1990-11-19

    IPC分类号: G03C1/035 G03C1/815

    摘要: UV-sensitive negative acting silver halide photographic elements are used in contacting processes, and especially dry etch correction processes and can be safely handled under white light. These elements comprise a support base, a negative acting hydrophilic colloidal silver halide emulsion layer comprising photographic silver halide grains, and one or more hydrophilic colloidal layers, wherein said silver halide emulsion support base has on its surface most distant from the layer an antihalation layer comprising a water-removable UV-absorbing compound having significant absorption in the range of from 350 to 400 nm.

    摘要翻译: UV敏感的负性卤化银照相元件用于接触过程,特别是干蚀刻校正工艺,并可在白光下安全处理。 这些元件包括支撑基底,负离子的亲水性胶体卤化银乳剂层,其包含照相卤化银颗粒和一种或多种亲水性胶体层,其中所述卤化银乳剂支持基底在其表面最远离所述层,所述防光晕层包含 具有350-400nm范围内显着吸收的水可去除的UV吸收化合物。