System and method for uniformity correction
    1.
    发明授权
    System and method for uniformity correction 有权
    用于均匀校正的系统和方法

    公开(公告)号:US07525641B2

    公开(公告)日:2009-04-28

    申请号:US11295517

    申请日:2005-12-07

    IPC分类号: G03B27/72 G03B27/42

    摘要: A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.

    摘要翻译: 提供了一种用于均匀性校正的系统和方法。 该系统包括以限定的构造插入到照明场中的多个翼状校正元件。 相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。 每个翼状校正元件在校正元件的纵向边缘上具有第一突出部,并且在相对的纵向边缘上具有第二突起。 第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。 此外,由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。