公开(公告)号：US07525641B2

公开(公告)日：2009-04-28

申请号：US11295517

申请日：2005-12-07

申请人： Richard C. Zimmerman ,  Eric B. Catey ,  David A. Hult ,  Alexander C. Kremer ,  Heine Melle Mulder ,  Hendrikus Robertus Marie Van Greevenbroek ,  Roberto B. Wiener

发明人： Richard C. Zimmerman ,  Eric B. Catey ,  David A. Hult ,  Alexander C. Kremer ,  Heine Melle Mulder ,  Hendrikus Robertus Marie Van Greevenbroek ,  Roberto B. Wiener

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G02B27/0012 ,  G02B7/346 ,  G03F7/70125 ,  G03F7/70191

摘要： A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.

摘要翻译： 提供了一种用于均匀性校正的系统和方法。 该系统包括以限定的构造插入到照明场中的多个翼状校正元件。 相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。 每个翼状校正元件在校正元件的纵向边缘上具有第一突出部，并且在相对的纵向边缘上具有第二突起。 第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。 此外，由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。

公开(公告)号：US06239863B1

公开(公告)日：2001-05-29

申请号：US09473710

申请日：1999-12-29

申请人： Eric B. Catey ,  David Hult ,  Santiago del Puerto ,  Stephen Roux

发明人： Eric B. Catey ,  David Hult ,  Santiago del Puerto ,  Stephen Roux

IPC分类号： G03B2762

CPC分类号： H01L21/67359 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  H01L21/67369

摘要： A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener that applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. A plurality of fasteners are used to position and secure the removable cover and reticle. A method of performing lithography and a lithographic system are also described.

摘要翻译： 描述了用于保护光刻系统中使用的掩模版的可拆卸盖。 可拆卸的盖包括框架和由框架支撑的膜。 膜对于检查波长是透明的，使得可以用可移除的盖检查掩模版就位。 当可拆卸的盖子就位时，该可移除的盖保护掩模版并且可移除以进行光刻曝光。 可移除的盖可以进一步包括至少一个标线紧固件，该紧固件对分划板施加力，从而防止当可拆卸盖位于适当位置时可拆卸盖相对于掩模版的移动。 使用多个紧固件来定位和固定可移除的盖和掩模版。 还描述了执行光刻和光刻系统的方法。