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1.发明申请Lithographic Apparatus and Method for Illumination Uniformity Correction and Uniformity Drift Compensation 有权平版印刷设备和照明方法均匀性校正和均匀漂移补偿公开(公告)号：US20100302525A1
公开(公告)日：2010-12-02
申请号：US12789795
申请日：2010-05-28
申请人： Richard Carl ZIMMERMAN , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
发明人： Richard Carl ZIMMERMAN , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
CPC分类号： G03F7/70191 , G03F7/70058 , G03F7/70133
摘要： A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.
摘要翻译： 公开了一种包括均匀性校正系统的光刻设备。 手指进入和离开与辐射束的交叉，以校正辐射束的强度。 驱动装置连接到手指。 每个手指的尖端的宽度是致动装置的宽度的一半。 系统和方法补偿均匀性漂移。 测量由系统漂移引起的照明狭缝均匀度。 均匀性补偿器的第一位置基于均匀性来确定。 均匀性补偿器被移动到第一各个位置。 将基材曝光。
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2.发明授权Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation 有权用于照明均匀性校正和均匀漂移补偿的平版印刷设备和方法公开(公告)号：US08629973B2
公开(公告)日：2014-01-14
申请号：US12789795
申请日：2010-05-28
申请人： Richard Carl Zimmerman , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
发明人： Richard Carl Zimmerman , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
CPC分类号： G03F7/70191 , G03F7/70058 , G03F7/70133
摘要： A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.
摘要翻译： 公开了一种包括均匀性校正系统的光刻设备。 手指进入和离开与辐射束的交叉，以校正辐射束的强度。 驱动装置连接到手指。 每个手指的尖端的宽度是致动装置的宽度的一半。 系统和方法补偿均匀性漂移。 测量由系统漂移引起的照明狭缝均匀度。 均匀性补偿器的第一位置基于均匀性来确定。 均匀性补偿器被移动到第一各个位置。 将基材曝光。
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公开(公告)号：US4576441A
公开(公告)日：1986-03-18
申请号：US585815
申请日：1984-03-02
申请人： Frederick Kubick
发明人： Frederick Kubick
CPC分类号： H01Q3/44
摘要： A ferroelectric focussing and defocussing device for operation at millimeter wavelengths applicable for use as a component in radar systems. Electrodes direct fields reversibly and continuously modify the refractive character of the ferroelectric material of the device as incoming radiation seeks to proceed along the optic axis of the material. The device includes first and second material media sharing complementary sides with Fresnel contours.
摘要翻译： 用于在毫米波长下工作的铁电聚焦和散焦装置，适用于雷达系统中的组件。 当进入的辐射寻求沿着材料的光轴行进时，电极直接场可逆地并且连续地修改该装置的铁电材料的折射特性。 该装置包括与菲涅尔轮廓共享互补面的第一和第二材料介质。
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公开(公告)号：US4987418A
公开(公告)日：1991-01-22
申请号：US138775
申请日：1987-12-28
CPC分类号： H01Q15/148
摘要： An arrangement for modifying impressed radars signals with an internally generated signal to establish a misrepresentative return signal which is confusing as to actual range, size and position.
摘要翻译： 用于利用内部产生的信号修改外加雷达信号的装置，以建立对于实际范围，大小和位置而言混淆的虚假表示返回信号。
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公开(公告)号：US4706094A
公开(公告)日：1987-11-10
申请号：US730401
申请日：1985-05-03
申请人： Frederick Kubick
发明人： Frederick Kubick
CPC分类号： H01Q3/2676 , H01Q3/44
摘要： A scanner (13) of ferroelectric material (17) for redirecting the orientation of a beam (22) of millimeter wavelength radiation. The scanner (13) includes parallel input and output sides with matching layers (44). Adjacent and opposite parallel wire grid electrodes (31') are addressed with progressive voltage difference excitation levels across the face of the ferroelectric material in order progressively to modify the refractive index distribution of the scanner and thereby conduct effective beam steering.
摘要翻译： 一种铁电材料（17）的扫描器（13），用于重新定向毫米波长辐射的光束（22）的取向。 扫描器（13）包括具有匹配层（44）的平行输入和输出侧。 相邻的和相对的平行的线栅电极（31'）以逐渐的电压差激发电平在铁电材料的表面上被寻址，以逐渐改变扫描器的折射率分布，从而导致有效的光束转向。
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公开(公告)号：US4639093A
公开(公告)日：1987-01-27
申请号：US585817
申请日：1984-03-02
申请人： Frederick Kubick
发明人： Frederick Kubick
IPC分类号： H01Q15/08 , G02F1/23 , G02F1/25 , H01P1/165 , H01P1/20 , H01Q15/24 , G02B27/00 , G02F1/05 , G02F1/21
摘要： A ferroelectric switchable bandwidth filter device for operation at millimeter wavelengths applicable for use as a component in radar systems. Electrode pairs pulse switch fields reversibly to flip-flop the optic axes of the ferroelectric material in several stages of the device from one domain state to the other.
摘要翻译： 用于在毫米波长下工作的铁电可切换带宽滤波器装置，适用于雷达系统中的组件。 电极对脉冲开关场可逆地将铁电材料的光轴从一个畴状态到另一个状态触发器件的几个阶段。
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公开(公告)号：US4636799A
公开(公告)日：1987-01-13
申请号：US730400
申请日：1985-05-03
申请人： Frederick Kubick
发明人： Frederick Kubick
CPC分类号： H01Q3/44
摘要： A scanner (13) of ferroelectric material (17) for redirecting a beam (22) of millimeter wavelength radiation. The scanner (13) includes parallel input and output sides with matching layers (44). Adjacent and opposite parallel wire grid electrodes (31') are addressed with opposite sense voltage pulses in order to redirect the domain orientation of crystals in selected regions of said ferroelectric material (17).
摘要翻译： 一种用于重新定向毫米波长辐射的光束（22）的铁电材料（17）的扫描器（13）。 扫描器（13）包括具有匹配层（44）的平行输入和输出侧。 以相反的感测电压脉冲寻址相邻和相对的平行线栅极（31'），以便重定向所述铁电材料（17）的选定区域中的晶体的畴取向。
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