Method for thin film deposition matching rate of expansion of shadow mask to rate of expansion of substrate
    4.
    发明授权
    Method for thin film deposition matching rate of expansion of shadow mask to rate of expansion of substrate 有权
    薄膜沉积匹配扩散率与掩膜膨胀速率的方法

    公开(公告)号:US06821561B2

    公开(公告)日:2004-11-23

    申请号:US10106385

    申请日:2002-03-26

    IPC分类号: C23C1404

    CPC分类号: C23C14/042

    摘要: A shadow mask material is selected so that the expansion characteristics of the shadow mask during thin film deposition closely match the expansion characteristics of the substrate. The shadow mask material is typically one with a low coefficient of thermal expansion (CTE). The shadow mask material must typically meet additional criteria, such as mechanical strength, feature quality, and dimensional accuracy criteria.

    摘要翻译: 选择阴影掩模材料,使得薄膜沉积期间荫罩的膨胀特性与基板的膨胀特性紧密匹配。 荫罩材料通常是具有低热膨胀系数(CTE)的材料。 荫罩材料通常必须符合额外的标准,例如机械强度,特征质量和尺寸精度标准。