公开(公告)号：US20140094094A1

公开(公告)日：2014-04-03

申请号：US14030843

申请日：2013-09-18

申请人： Robert A. Rizzuto ,  Ajay Krishnan ,  Christopher Arcona ,  Anand Tanikella

发明人： Robert A. Rizzuto ,  Ajay Krishnan ,  Christopher Arcona ,  Anand Tanikella

IPC分类号： B24B7/22

CPC分类号： B24B7/228 ,  B24B7/17 ,  B24B37/08 ,  B24B57/02

摘要： A method of forming a substrate is performed by grinding a substrate using abrasives so that both major surfaces of the substrate achieve desired flatness, smoothness, or both. In an embodiment, a coarser abrasive is used to grind one major surface, while a finer abrasive is simultaneously used to grind the other major surface. A single grinding step can used to produce a substrate having opposing surfaces of different surface roughnesses. This may help to eliminate a typical second downstream fine polishing step used in the prior art. Embodiments can be used with a wide variety of substrates, including sapphire, silicon carbide and gallium nitride single crystal structures grown by various techniques.

摘要翻译： 通过使用研磨剂研磨衬底来进行形成衬底的方法，使得衬底的两个主表面实现期望的平坦度，平滑度或两者。 在一个实施方案中，使用较粗的研磨剂研磨一个主表面，同时使用较细磨料研磨另一主表面。 可以使用单个研磨步骤来生产具有不同表面粗糙度的相对表面的基材。 这可能有助于消除现有技术中使用的典型的第二下游精细抛光步骤。 实施例可以用于各种各样的基板，包括通过各种技术生长的蓝宝石，碳化硅和氮化镓单晶结构。

公开(公告)号：US20140285007A1

公开(公告)日：2014-09-25

申请号：US13847004

申请日：2013-03-19

申请人： Ajay Krishnan

发明人： Ajay Krishnan

IPC分类号： H02J4/00

CPC分类号： H02J4/00 ,  C25B1/04 ,  C25B5/00 ,  C25B15/02 ,  H01M8/04932 ,  H01M8/04947 ,  H01M8/16 ,  H01M16/003 ,  H01M2250/10 ,  Y02B90/14 ,  Y02E60/366 ,  Y02E60/527 ,  Y02E60/566 ,  Y10T307/352

摘要： Various embodiments of the invention include a power management unit (PMU) to simultaneously control the production of hydrogen and electricity for external use in an MFC-MEC coupled system. In one embodiment, the PMU includes low voltage electronic switches using MOSFETs, and a PWM controller. The PWM controller creates timing waveform necessary to operate the switches. In other embodiments, the switches can be replaced by any switching regulator capable of operating at low operating voltage and currents that yield high efficiency. Such a system can be used in a waste-water treatment facility.

摘要翻译： 本发明的各种实施例包括在MFC-MEC耦合系统中同时控制用于外部使用的氢和电的产生的功率管理单元（PMU）。 在一个实施例中，PMU包括使用MOSFET的低压电子开关和PWM控制器。 PWM控制器创建操作开关所需的定时波形。 在其他实施例中，开关可以由能够在低工作电压和电流下运行的任何开关调节器代替，从而产生高效率。 这种系统可以用在废水处理设备中。

公开(公告)号：US09509030B2

公开(公告)日：2016-11-29

申请号：US13847004

申请日：2013-03-19

申请人： Ajay Krishnan

发明人： Ajay Krishnan

IPC分类号： H02J4/00 ,  H01M16/00 ,  C25B1/04 ,  H01M8/04 ,  H01M8/16 ,  C25B15/02 ,  C25B5/00

CPC分类号： H02J4/00 ,  C25B1/04 ,  C25B5/00 ,  C25B15/02 ,  H01M8/04932 ,  H01M8/04947 ,  H01M8/16 ,  H01M16/003 ,  H01M2250/10 ,  Y02B90/14 ,  Y02E60/366 ,  Y02E60/527 ,  Y02E60/566 ,  Y10T307/352

摘要： Various embodiments of the invention include a power management unit (PMU) to simultaneously control the production of hydrogen and electricity for external use in an MFC-MEC coupled system. In one embodiment, the PMU includes low voltage electronic switches using MOSFETs, and a PWM controller. The PWM controller creates timing waveform necessary to operate the switches. In other embodiments, the switches can be replaced by any switching regulator capable of operating at low operating voltage and currents that yield high efficiency. Such a system can be used in a waste-water treatment facility.

摘要翻译： 本发明的各种实施例包括在MFC-MEC耦合系统中同时控制用于外部使用的氢和电的产生的功率管理单元（PMU）。 在一个实施例中，PMU包括使用MOSFET的低压电子开关和PWM控制器。 PWM控制器创建操作开关所需的定时波形。 在其他实施例中，开关可以由能够在低工作电压和电流下运行的任何开关调节器代替，从而产生高效率。 这种系统可以用在废水处理设备中。

公开(公告)号：US5451551A

公开(公告)日：1995-09-19

申请号：US290652

申请日：1994-08-15

申请人： Ajay Krishnan ,  Nalin Kumar

发明人： Ajay Krishnan ,  Nalin Kumar

IPC分类号： H01L21/768 ,  H05K3/38 ,  H05K3/46 ,  H01L21/02

CPC分类号： H01L21/76849 ,  H01L21/76843 ,  H01L21/76877 ,  H05K3/38 ,  H05K3/4644

摘要： A maskless process for forming a protected metal feature in a planar insulating layer of a substrate is disclosed. A first barrier material is disposed in a recess in an insulating layer, a conductive metal is disposed on the first barrier material such that the entire metal feature is positioned within the recess below the top of the recess, a second barrier material is disposed on the metal feature such that the second barrier material occupies the entire portion of the recess above the-metal feature and extends above the top surface of the insulating layer, and the second barrier material is then polished until the top of the second barrier material is in and aligned with the top of the insulating layer. As a result, the metal feature is surrounded and protected by the first and second barrier materials, and the substrate is planarized.

摘要翻译： 公开了一种用于在基板的平面绝缘层中形成受保护的金属特征的无掩模工艺。 第一阻挡材料设置在绝缘层的凹部中，导电金属设置在第一阻挡材料上，使得整个金属特征位于凹部下方的凹部内，第二阻挡材料设置在 金属特征使得第二阻挡材料占据金属特征上方的凹部的整个部分并且在绝缘层的顶表面上方延伸，然后抛光第二阻挡材料直到第二阻挡材料的顶部在 与绝缘层的顶部对齐。 结果，金属特征被第一和第二阻挡材料包围和保护，并且基板被平坦化。

公开(公告)号：US5380546A

公开(公告)日：1995-01-10

申请号：US075062

申请日：1993-06-09

申请人： Ajay Krishnan ,  Nalin Kumar

发明人： Ajay Krishnan ,  Nalin Kumar

IPC分类号： H01L21/768 ,  H05K3/38 ,  H05K3/46 ,  B05D5/12

CPC分类号： H01L21/76849 ,  H01L21/76843 ,  H01L21/76877 ,  H05K3/38 ,  H05K3/4644

摘要： A maskless process for forming a protected metal feature in a planar insulating layer of a substrate is disclosed. A first barrier material is disposed in a recess in an insulating layer, a conductive metal is disposed on the first barrier material such that the entire metal feature is positioned within the recess below the top of the recess, a second barrier material is disposed on the metal feature such that the second barrier material occupies the entire portion of the recess above the metal feature and extends above the top surface of the insulating layer, and the second barrier material is then polished until the top of the second barrier material is in and aligned with the top of the insulating layer. As a result, the metal feature is surrounded and protected by the first and second barrier materials, and the substrate is planarized.

摘要翻译： 公开了一种用于在基板的平面绝缘层中形成受保护的金属特征的无掩模工艺。 第一阻挡材料设置在绝缘层的凹部中，导电金属设置在第一阻挡材料上，使得整个金属特征位于凹部下方的凹部内，第二阻挡材料设置在 金属特征使得第二阻挡材料占据金属部件上方的凹部的整个部分，并且在绝缘层的顶表面上方延伸，然后抛光第二阻挡材料直到第二阻挡材料的顶部处于并排列 与绝缘层的顶部。 结果，金属特征被第一和第二阻挡材料包围和保护，并且基板被平坦化。

公开(公告)号：US20160372931A9

公开(公告)日：2016-12-22

申请号：US13847004

申请日：2013-03-19

申请人： Ajay Krishnan

发明人： Ajay Krishnan

IPC分类号： H02J4/00

CPC分类号： H02J4/00 ,  C25B1/04 ,  C25B5/00 ,  C25B15/02 ,  H01M8/04932 ,  H01M8/04947 ,  H01M8/16 ,  H01M16/003 ,  H01M2250/10 ,  Y02B90/14 ,  Y02E60/366 ,  Y02E60/527 ,  Y02E60/566 ,  Y10T307/352

摘要： Various embodiments of the invention include a power management unit (PMU) to simultaneously control the production of hydrogen and electricity for external use in an MFC-MEC coupled system. In one embodiment, the PMU includes low voltage electronic switches using MOSFETs, and a PWM controller. The PWM controller creates timing waveform necessary to operate the switches. In other embodiments, the switches can be replaced by any switching regulator capable of operating at low operating voltage and currents that yield high efficiency. Such a system can be used in a waste-water treatment facility.

摘要翻译： 本发明的各种实施例包括在MFC-MEC耦合系统中同时控制用于外部使用的氢和电的产生的功率管理单元（PMU）。 在一个实施例中，PMU包括使用MOSFET的低压电子开关和PWM控制器。 PWM控制器创建操作开关所需的定时波形。 在其他实施例中，开关可以由能够在低工作电压和电流下运行的任何开关调节器代替，从而产生高效率。 这种系统可以用在废水处理设备中。

公开(公告)号：US20150279364A1

公开(公告)日：2015-10-01

申请号：US14229910

申请日：2014-03-29

申请人： Ajay Krishnan ,  Akash Krishnan

发明人： Ajay Krishnan ,  Akash Krishnan

IPC分类号： G10L15/25

CPC分类号： G10L15/25 ,  G06K9/00335 ,  G09B21/009 ,  G10L25/57

摘要： The invention described here uses a Mouth Phoneme Model that relates phonemes and visemes using audio and visual information. This method allows for the direct conversion between lip movements and phonemes, and furthermore, the lip reading of any word in the English language. Speech API was used to extract phonemes from audio data obtained from a database which consists of video and audio information of humans speaking a word in different accents. A machine learning algorithm similar to WEKA (Waikato Environment for Knowledge Analysis) was used to train the lip reading system.

摘要翻译： 这里描述的发明使用口音音素模型，其使用音频和视觉信息来关联音素和视力。 这种方法允许唇部运动和音素之间的直接转换，以及英语中任何单词的唇读。 语音API用于从从数据库中获得的音频数据中提取音素，该数据库由人类以不同口音说出的单词的视频和音频信息组成。 使用类似于WEKA（怀卡托环境知识分析）的机器学习算法来训练唇读系统。