Interferometer and Method for Producing an Interferometer

    公开(公告)号:US20210262858A1

    公开(公告)日:2021-08-26

    申请号:US17047278

    申请日:2019-04-10

    Abstract: An interferometer includes a holding element having an actuation recess, a first mirror element arranged on the holding element opposite the actuation recess, and a second mirror element arranged opposite the first mirror element at a mirror distance, to form an optical slit. The first mirror element is arranged between the second mirror element and the holding element and the optical slit is spatially separated from the actuation recess by the first mirror element. The interferometer further includes an electrode pair including a first actuation electrode in one of the mirror elements and a second actuation electrode on a side of the actuation recess opposite the first actuation electrode. The mirror distance can be varied by applying an electrical voltage to the electrode pair.

    Micromechanical mirror device, mirror system, and method for producing a micromechanical mirror device

    公开(公告)号:US11709354B2

    公开(公告)日:2023-07-25

    申请号:US16966425

    申请日:2019-01-24

    CPC classification number: G02B26/0833 G02B26/001

    Abstract: A micromechanical mirror device, a mirror system, and a method for producing a micromechanical mirror device are disclosed. The mirror device comprises a first mirror element, which is flat, and a second mirror element, which is flat. The first and second mirror elements are arranged substantially plane-parallel. An intermediate space between the first and second mirror elements has a lower index of refraction than one or both of the first mirror element and second mirror element. The first and second mirror elements are locally spaced apart from each other by at least one support structure. The support structure overlaps with the first and second mirror elements in an axial direction, which is perpendicular to the first and second mirror elements. The support structure includes a material that is different from a material from which one or both of the first and second mirror elements are formed.

    Micromechanical Mirror Device, Mirror System, and Method for Producing a Micromechanical Mirror Device

    公开(公告)号:US20210033847A1

    公开(公告)日:2021-02-04

    申请号:US16966425

    申请日:2019-01-24

    Abstract: A micromechanical mirror device, a mirror system, and a method for producing a micromechanical mirror device are disclosed. The mirror device comprises a first mirror element, which is flat, and a second mirror element, which is flat. The first and second mirror elements are arranged substantially plane-parallel. An intermediate space between the first and second mirror elements has a lower index of refraction than one or both of the first mirror element and second mirror element. The first and second mirror elements are locally spaced apart from each other by at least one support structure. The support structure overlaps with the first and second mirror elements in an axial direction, which is perpendicular to the first and second mirror elements. The support structure includes a material that is different from a material from which one or both of the first and second mirror elements are formed.

    Interferometer device and method for operating an interferometer device

    公开(公告)号:US11346721B2

    公开(公告)日:2022-05-31

    申请号:US16924278

    申请日:2020-07-09

    Abstract: An interferometer device includes an interferometer unit with at least two mirrors disposed in parallel, wherein at least one of the mirrors is actuatable parallel to the other mirror and a first distance between the two mirrors is alterable. The interferometer device further includes at least one deflection mirror disposed downstream of the interferometer unit in a light transmission direction of light from the interferometer unit and a detector device, onto which the light is able to be aligned by the deflection mirror. The detector device includes at least two differently sensitive detection regions for transmitted wavelengths or wavelength ranges of the light, which detection regions are spatially separated from one another and able to be irradiated separately by the deflection mirror.

    METHOD FOR PRODUCING A MICRO-ELECTROMECHANICAL OSCILLATORY SYSTEM AND PIEZOELECTRIC MICROMACHINED ULTRASONIC TRANSDUCER

    公开(公告)号:US20240155947A1

    公开(公告)日:2024-05-09

    申请号:US18547202

    申请日:2022-04-07

    CPC classification number: H10N30/03 B06B1/0644

    Abstract: A method for producing a micro-electromechanical oscillatory system. A carrier substrate with a first surface is provided and a first passivation layer is applied onto the first surface. A first polysilicon layer grows on top of the first passivation layer and/or the first surface of the carrier substrate and a second passivation layer is applied onto a second surface of the first polysilicon layer. A second polysilicon layer grows on top of the first polysilicon layer and/or the second passivation layer. A transducer element is applied onto a third surface of the second polysilicon layer. A first trench is produced through the carrier substrate and the first polysilicon layer in the direction of the transducer element. The first trench extends as far as the second passivation layer, such that an oscillatable transducer plate of the micro-electromechanical oscillatory system is produced adjoining the first trench using the second polysilicon layer.

    METHOD FOR PRODUCING A MICROELECTROMECHANICAL OSCILLATION SYSTEM AND PIEZOELECTRIC MICROMACHINED ULTRASONIC TRANSDUCER

    公开(公告)号:US20240147862A1

    公开(公告)日:2024-05-02

    申请号:US18547915

    申请日:2022-04-25

    CPC classification number: H10N30/03 B06B1/0644

    Abstract: A method for producing a microelectromechanical oscillation system. A carrier substrate having a first surface is provided. A circumferential first trench is produced, which extends from the first surface at least partially through the carrier substrate. A passivation layer is applied to the first surface of the first carrier substrate and the first circumferential trench is at least partially filled with the passivation layer. A first polysilicon layer is grown on the passivation layer and/or the first surface of the carrier substrate. A transducer element of the microelectromechanical oscillation system is arranged on a second surface of the first polysilicon layer. A second trench is produced through the carrier substrate in the direction of the transducer element, which extends up to the passivation layer so that the oscillatable transducer plate of the microelectromechanical oscillation system is produced adjacent to the second trench using the first polysilicon layer.

    Spectrometer device and method for producing a spectrometer device

    公开(公告)号:US11604093B2

    公开(公告)日:2023-03-14

    申请号:US17262892

    申请日:2019-07-09

    Abstract: A spectrometer device includes a Fabry-Perot interferometer unit, which comprises a first carrier substrate, wherein the first carrier substrate is arranged on a lower side of the Fabry-Perot interferometer unit and includes an optical aperture. The spectrometer includes at least one of a first substrate, which is arranged on an upper side of the Fabry-Perot interferometer unit, which faces away from the lower side, and a second substrate with the first carrier substrate arranged with the lower side on the second substrate. The spectrometer further includes a photodetector device arranged on or in the at least one of the second substrate and the first substrate. A first electrical connection region of the photodetector device and a second electrical connection region of the Fabry-Perot interferometer unit are electrically contacted from the same direction.

    Interferometer Device and Mehod for Operating an Interferometer Device

    公开(公告)号:US20210010866A1

    公开(公告)日:2021-01-14

    申请号:US16924278

    申请日:2020-07-09

    Abstract: An interferometer device includes an interferometer unit with at least two mirrors disposed in parallel, wherein at least one of the mirrors is actuatable parallel to the other mirror and a first distance between the two mirrors is alterable. The interferometer device further includes at least one deflection mirror disposed downstream of the interferometer unit in a light transmission direction of light from the interferometer unit and a detector device, onto which the light is able to be aligned by the deflection mirror. The detector device includes at least two differently sensitive detection regions for transmitted wavelengths or wavelength ranges of the light, which detection regions are spatially separated from one another and able to be irradiated separately by the deflection mirror.

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