公开(公告)号：US20230099348A1

公开(公告)日：2023-03-30

申请号：US17475436

申请日：2021-09-15

Applicant: Rohm And Haas Electronic Materials Korea Ltd.

Inventor： Philjae Kang ,  Kwang Mo Choi ,  Yoo Jung Yoon ,  Won Seok Lee ,  Hae-Jin Lim

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/32 ,  G03F7/34

Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.

公开(公告)号：US11874603B2

公开(公告)日：2024-01-16

申请号：US17475436

申请日：2021-09-15

Applicant: Rohm And Haas Electronic Materials Korea Ltd.

Inventor： Philjae Kang ,  Kwang Mo Choi ,  Yoo Jung Yoon ,  Won Seok Lee ,  Hae-Jin Lim

IPC: G03F7/039 ,  G03F7/38 ,  G03F7/004 ,  G03F7/34 ,  G03F7/32

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/325 ,  G03F7/34

Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.