公开(公告)号：US20040229762A1

公开(公告)日：2004-11-18

申请号：US10845878

申请日：2004-05-13

Applicant: Rohm and Haas Electronic Materials, L.L.C.

Inventor： Edward W. Rutter JR.

IPC: C11D001/00

CPC classification number: C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/5022 ,  C11D11/0047

Abstract: Compositions useful for the removal of polymeric material from substrates, such as magnetoresistive sensors, are provided. Methods of removing such polymeric material from magnetoresistive sensors and methods of manufacturing magnetoresistive sensors are also provided.

Abstract translation: 提供了可用于从衬底去除聚合物材料的组合物，例如磁阻传感器。 还提供了从磁阻传感器去除这种聚合材料的方法以及制造磁阻传感器的方法。

公开(公告)号：US20040220066A1

公开(公告)日：2004-11-04

申请号：US10835928

申请日：2004-04-30

Applicant: Rohm and Haas Electronic Materials, L.L.C.

Inventor： Edward W. Rutter JR.

IPC: H05H001/00

CPC classification number: H01L21/02063 ,  C11D7/14 ,  C11D7/3209 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/425 ,  H05K3/288

Abstract: Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are also provided.

Abstract translation: 提供了适合于从基底去除聚合物材料，特别是后等离子体蚀刻聚合物材料的组合物。 这些组合物含有一种或多种季铵硅酸盐作为活性成分。 还提供了使用这些组合物除去聚合物材料的方法。