Method for directly depositing metal containing patterned films
    1.
    发明授权
    Method for directly depositing metal containing patterned films 失效
    用于直接沉积含金属图案的薄膜的方法

    公开(公告)号:US5534312A

    公开(公告)日:1996-07-09

    申请号:US339127

    申请日:1994-11-14

    CPC分类号: C23C18/14 H05K3/105

    摘要: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying an amorphous film of a metal complex to a substrate. The film may be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low temperature chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres. The resulting patterned film is generally planar. Separate planarization steps are not generally required.

    摘要翻译: 描述了制造金属氧化物,金属或其它含金属化合物的图案化膜的无光致抗蚀剂方法。 该方法包括将金属络合物的非晶膜施加到基底上。 可以使用标准工业技术通过旋涂方便地施加该膜。 所使用的金属络合物是光反应性的并且在合适波长的光存在下经历低温化学反应。 反应的最终产物取决于反应发生的气氛。 金属氧化物膜可以在空气中制成。 图案化的膜可以通过仅将膜的选定部分曝光而制成。 通过将不同部分的膜暴露于不同气氛中的光,可以从相同的膜中放下两种或更多种材料的图案。 所得图案化膜通常是平面的。 通常不需要单独的平坦化步骤。