Phase shift mask and method of manufacturing display apparatus using the same
    1.
    发明授权
    Phase shift mask and method of manufacturing display apparatus using the same 有权
    相移掩模和使用其的显示装置的制造方法

    公开(公告)号:US09417516B2

    公开(公告)日:2016-08-16

    申请号:US14794079

    申请日:2015-07-08

    摘要: Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.

    摘要翻译: 提供一种制造显示装置的方法,所述方法包括在基板上形成非晶硅层; 通过用通过相移掩模发射的激光束照射非晶硅,将非晶硅层中的非晶硅变成晶体硅; 以及形成显示装置,所述相移掩模包括基底基板; 在所述基底基板上的阻挡层,并且包括在第一方向上彼此间隔开的多个透射部; 以及在第一方向交替地填充多个透射部的相移部。