公开(公告)号：US20140186595A1

公开(公告)日：2014-07-03

申请号：US13861039

申请日：2013-04-11

Applicant: SAMSUNG DISPLAY CO., LTD

Inventor： SANG HYUN YUN ,  CHA-DONG KIM ,  JUNG-IN PARK ,  JAE HYUK CHANG ,  HI KUK LEE

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/2022 ,  G02F1/133512 ,  G02F1/13394 ,  G03F7/0007 ,  G03F7/203 ,  G03F7/70475 ,  Y10T428/24851

Abstract: The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region.

Abstract translation: 本发明涉及使用无掩模曝光装置和显示装置制造显示装置的方法，更具体地说，涉及一种使用无掩模曝光装置制造显示装置的方法，该无掩模曝光装置能够防止 被观看，以及显示装置。 本发明的一个示例性实施例提供了一种制造显示装置的方法，包括：通过在用基于第一图案的图案信息的照射曝光光束的第一曝光头扫描基板的同时进行曝光来在基板上形成第一曝光区域 在扫描方向; 以及根据所述第一图案在所述扫描方向上的图案信息，利用照射曝光光束的第二曝光头对所述基板进行曝光，同时在所述基板上形成与所述第一曝光区域相邻的第二曝光区域; 其中第一曝光区域和第二曝光区域之间的曝光边界区域在扫描方向上延伸，并且曝光边界区域与遮光区域重叠。

公开(公告)号：US20150205212A1

公开(公告)日：2015-07-23

申请号：US14322442

申请日：2014-07-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： KI-BEOM LEE ,  HI-KUK LEE ,  CHA-DONG KIM ,  CHANG-HOON KIM ,  JUNG-IN PARK ,  KAB-JONG SEO ,  JUN-HO SIM ,  SANG-HYUN YUN ,  JAE-HYUK CHANG ,  HYUN-SEOK KIM ,  SANG-HYUN LEE

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70275

Abstract: A light exposure device is provided. The light exposure device includes a light source, a light modulation part, and a projection optical part. The light modulation part modulates the light based on a predetermined exposure pattern. The projection optical part projects the light from the light modulation part onto a substrate. The projection optical part includes a first optical part, a hole arrangement part, and a second optical part. The first optical part receives the light from the light modulation part. The first optical part includes a plurality of first lenses. The hole arrangement part emits the light from the first optical part. The second optical part emits the light from the hole arrangement part onto the substrate. The second optical part includes a plurality of second lenses. At least one of the first lenses and the second lenses is a transreflective lens.

Abstract translation: 提供曝光装置。 曝光装置包括光源，光调制部和投影光学部。 光调制部基于预定的曝光图案来调制光。 投影光学部件将来自光调制部的光投射到基板上。 投影光学部件包括第一光学部件，孔布置部分和第二光学部件。 第一光学部件接收来自光调制部分的光。 第一光学部件包括多个第一透镜。 孔布置部分发射来自第一光学部件的光。 第二光学部件将来自孔布置部分的光发射到基板上。 第二光学部件包括多个第二透镜。 第一透镜和第二透镜中的至少一个是透反透镜。