公开(公告)号：US10890848B2

公开(公告)日：2021-01-12

申请号：US16037232

申请日：2018-07-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoonjung Jang ,  Sooyoung Kim ,  Boodeuk Kim ,  Soojin Lee

IPC: G03F7/40 ,  G01N21/64 ,  G03F7/32 ,  C08B37/16 ,  G03F7/16 ,  C08L5/16

Abstract: Provided are a material for detecting photoresist and a method for detecting photoresist using the same. The material for detecting photoresist may include a macrocyclic molecule having a hollow structure and a fluorescent substance which is labeled on the macrocyclic molecule, and the macrocyclic molecule is at least one of cyclodexrin, cucurbituril, calixarene, pillararene and catenane.