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1.
公开(公告)号:US20190187052A1
公开(公告)日:2019-06-20
申请号:US16037232
申请日:2018-07-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yoonjung Jang , Sooyoung Kim , Boodeuk KIM , Soojin Lee
CPC classification number: G01N21/643 , C08B37/0015 , G01N2021/6439 , G03F7/16 , G03F7/327
Abstract: Provided are a material for detecting photoresist and a method for detecting photoresist using the same. The material for detecting photoresist may include a macrocyclic molecule having a hollow structure and a fluorescent substance which is labeled on the macrocyclic molecule, and the macrocyclic molecule is at least one of cyclodexrin, cucurbituril, calixarene, pillararene and catenane.
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2.
公开(公告)号:US10890848B2
公开(公告)日:2021-01-12
申请号:US16037232
申请日:2018-07-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yoonjung Jang , Sooyoung Kim , Boodeuk Kim , Soojin Lee
Abstract: Provided are a material for detecting photoresist and a method for detecting photoresist using the same. The material for detecting photoresist may include a macrocyclic molecule having a hollow structure and a fluorescent substance which is labeled on the macrocyclic molecule, and the macrocyclic molecule is at least one of cyclodexrin, cucurbituril, calixarene, pillararene and catenane.
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