公开(公告)号：US20230158453A1

公开(公告)日：2023-05-25

申请号：US18046495

申请日：2022-10-13

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Kyeongmin Baek ,  Sungmin Jang ,  Seongkeun Kang ,  Taehyun Kim ,  Seongyun Ryu ,  Byungku Yoo ,  Seungjun Lee ,  Woosung Choi ,  Haeyong Choi ,  Joungwoo Han

IPC分类号： B01D53/86

CPC分类号： B01D53/8631 ,  B01D2253/104 ,  B01D2253/108 ,  B01D2253/102 ,  B01D2253/3425 ,  B01D2255/9022 ,  B01D2257/40 ,  B01D2258/0216

摘要： An integrated waste gas treatment system includes an adsorption/desorption device that receives a waste gas that includes an organic compound and an organic nitrogen compound exhausted from a semiconductor manufacturing facility, where the adsorption/desorption device adsorbs the organic compound and the organic nitrogen compound and concentrates and desorbs the organic compound and the organic nitrogen compound, and a catalytic decomposition device disposed adjacent to the adsorption/desorption device, where the catalytic decomposition device includes a catalytic chamber that provides a gas passage through which a gas desorbed from the adsorption/desorption device flows and an oxidation-reduction catalyst disposed in the gas passage that removes the organic compound and the organic nitrogen compound from the desorbed gas. The organic compound and the organic nitrogen compound are subjected to an oxidation treatment by the oxidation-reduction catalyst, and nitrogen oxides generated by the oxidation treatment are removed by a selective reduction reaction.