公开(公告)号：US20240035188A1

公开(公告)日：2024-02-01

申请号：US18377658

申请日：2023-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinju KIM ,  Kyunghwan LEE ,  Cheolhee CHO ,  Youngdeog KOH ,  Kwangjoo KIM

IPC: C25D11/24 ,  C23F1/20 ,  C25D11/16

CPC classification number: C25D11/246 ,  C23F1/20 ,  C25D11/16 ,  C25D11/243

Abstract: Disclosed is a method of treating a surface of an aluminum material, the method including: degreasing an aluminum material; etching the degreased aluminum material; performing a first desmutting treatment by immersing the etched aluminum material in a 25-35 wt % nitric acid solution at a temperature in a range of 25 to 30° C. for at least 60 seconds; performing a second desmutting treatment by immersing the first desmutting-treated aluminum material in a 5-15 wt % nitric acid solution at a temperature in a range of 25 to 30° C. for a time in a range of 30 seconds to 60 seconds; anodizing the second desmutting-treated aluminum material; coloring the anodized aluminum material; and sealing the colored aluminum material.