SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM

    公开(公告)号:US20250001433A1

    公开(公告)日:2025-01-02

    申请号:US18428946

    申请日:2024-01-31

    Abstract: A substrate treating apparatus in which foreign substances are reduced by using a foreign substance collecting unit includes a magnetic structure. The substrate treating apparatus includes a roller configured to be disposed on a rail extending in a first direction and attached to a side surface of a carrier unit to move along the rail, and a foreign substance collecting unit installed on the side surface of the carrier unit, moving together with the roller, and configured to be spaced apart from the rail when the roller is disposed on the rail, wherein the foreign substance collecting unit includes a magnetic structure for adsorbing foreign magnetic substances using a magnetic force, and a case surrounding the magnetic structure.

    POLISHING PAD CONDITIONING APPARATUS
    2.
    发明申请

    公开(公告)号:US20200206870A1

    公开(公告)日:2020-07-02

    申请号:US16517849

    申请日:2019-07-22

    Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.

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