公开(公告)号：US20140162460A1

公开(公告)日：2014-06-12

申请号：US13950799

申请日：2013-07-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： HYUN-JONG LEE ,  Soo-Han Choi ,  Jung-Ho Do ,  Chul-Hong Park ,  Sang-Pil Sim

IPC: G06F17/50 ,  H01L21/308

CPC classification number: G06F17/5081 ,  H01L21/3086

Abstract: A method of forming a pattern includes defining a plurality of patterns, defining a plurality of pitch violating patterns that contact the plurality of patterns and correspond to regions between the patterns, classifying the plurality of pitch violating patterns into a first region and a second region that is adjacent to the first region, selecting one of the first region and the second region, and forming an initial pattern defined as the selected first or second region. The selecting includes performing at least one of i) selecting a region that contact dummy patterns, ii) selecting a region of a same kind as one region, and iii) selecting a region that contacts a concave part of an enclosure from the first region and the second region.

Abstract translation: 形成图案的方法包括限定多个图案，限定接触所述多个图案并对应于所述图案之间的区域的多个倾斜违规图案，将所述多个音高违规图案分类为第一区域和第二区域， 与第一区域相邻，选择第一区域和第二区域中的一个，以及形成被定义为所选择的第一或第二区域的初始图案。 所述选择包括执行以下各项中的至少一个：i）选择接触虚拟图案的区域，ii）选择与一个区域相同类型的区域，以及iii）从所述第一区域选择与外壳的凹部接触的区域，以及 第二个地区。