ELECTRONIC DEVICE FOR OBFUSCATING AND DECODING DATA AND METHOD FOR CONTROLLING SAME

    公开(公告)号:US20200311306A1

    公开(公告)日:2020-10-01

    申请号:US16771359

    申请日:2019-01-04

    Abstract: Disclosed are an electronic device for obfuscating user data and a server for decoding the same. A method for controlling an electronic device according to the present disclosure comprises the steps of: acquiring a security parameter according to data transmitted to an external server; applying an obfuscation algorithm to the data by using the security parameter; and transmitting the data, to which the obfuscation algorithm has been applied, to the external server. Furthermore, in connection with a method for controlling a system comprising an electronic device for obfuscating data and a server for decoding the same according to the present disclosure, a method for controlling the electronic device comprises the steps of: inserting a fingerprint into data; generating multiple pieces of split data having a preset first size on the basis of the data into which the fingerprint has been inserted; applying an obfuscation algorithm to one piece of split data selected from the multiple pieces of split data by using a preset security parameter; and transmitting the split data, to which the obfuscation algorithm has been applied, to the server. In addition, a method for controlling the server comprises the steps of: receiving the multiple pieces of split data, to which the obfuscation algorithm has been applied, from the electronic device; acquiring at least one piece of candidate data on the basis of the received multiple pieces of split data, to which the obfuscation algorithm has been applied; and acquiring data comprising the fingerprint among the at least one piece of candidate data.

    METHOD FOR FABRICATING MASK BY PERFORMING OPTICAL PROXIMITY CORRECTION

    公开(公告)号:US20170139317A1

    公开(公告)日:2017-05-18

    申请号:US15334508

    申请日:2016-10-26

    CPC classification number: G03F1/36

    Abstract: A mask fabricating method includes dividing an outline of a first design layout for a target layer into plural segments, selecting interest segments to be biased in a direction of approaching an outline of a second design layout for a lower layer of the target layer, performing optical proximity correction for the target layer based on a first cost function given to each of normal segments and a second cost function given to each of the interest segments, and fabricating the mask corresponding to the first design layout updated based on a result of the optical proximity correction. The second cost function includes a model of a margin between each of the interest segments and the outline of the second design layout. Performing the optical proximity correction includes biasing each of the interest segments up to a boundary defined by the margin.

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