公开(公告)号：US20240279808A1

公开(公告)日：2024-08-22

申请号：US18419021

申请日：2024-01-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minsoo PARK ,  Songyi BAEK ,  Hyungwoo CHOI

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/448 ,  C23C16/52

CPC classification number: C23C16/45561 ,  C23C16/4405 ,  C23C16/448 ,  C23C16/52

Abstract: A gas supply system includes a manifold for supplying gases for processing the substrate to a process chamber; a cleaning gas supply line supplying a cleaning gas to the manifold; a first inert gas supply line supplying a first inert gas to the cleaning gas supply line; a first opening/closing valve opening and closing the cleaning gas supply line; a reaction gas supply line supplying a reaction gas to the manifold; a source gas supply line provided with a vaporizer and supplying the source gas to the manifold; a second inert gas supply line supplying a second inert gas to the manifold and branching out to a carrier gas supply line connected to the vaporizer and a curtain gas supply line bypassing the vaporizer; a second opening/closing valve selectively opening or closing the carrier gas supply line and the curtain gas supply line; and a controller.