SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS USING THE SAME

    公开(公告)号:US20220037215A1

    公开(公告)日:2022-02-03

    申请号:US17180343

    申请日:2021-02-19

    Abstract: A semiconductor substrate processing apparatus includes: a metastructure layer divided into a plurality of microstructures by grooves, a light-transmitting dielectric substrate that supports the plurality of microstructures and is configured to allow an electromagnetic wave to be transmitted therethrough, and a frame including an exhaust hole configured to receive gas introduced from the grooves such as to provide suction force to the semiconductor substrate, wherein each of the plurality of microstructures has a smaller width than a wavelength of the electromagnetic wave, and each of the grooves has a smaller width than the wavelength of the electromagnetic wave.

    PROBE FOR DETECTING NEAR FIELD AND NEAR-FIELD DETECTION SYSTEM INCLUDING THE SAME

    公开(公告)号:US20220082584A1

    公开(公告)日:2022-03-17

    申请号:US17333924

    申请日:2021-05-28

    Abstract: A near-field detection system includes include an electric field generator configured to apply an electric field to an analysis sample, a probe configured to detect a near field that has passed through the analysis sample, a current detector connected to the probe, and a laser system irradiating a laser to each of the electric field generator and the probe. The probe includes a cantilever substrate, an antenna electrode on the cantilever substrate, an electromagnetic wave blocking layer exposing a sensing region of the cantilever substrate, the electromagnetic wave blocking layer including a conductive material, and an insulating layer interposed between the cantilever substrate and the electromagnetic wave blocking layer such that the insulating layer is between the antenna electrode and the electromagnetic wave blocking layer.

Patent Agency Ranking