-
1.发明申请公开(公告)号：US20190136132A1
公开(公告)日：2019-05-09
申请号：US15973486
申请日：2018-05-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： HOON HAN , SANG WON BAE , YOUNG TAEK HON , JAEWAN PARK , JINUK LEE , JUNGHUN LIM
IPC: C09K13/06 , H01L21/311
Abstract: A composition for etching may include phosphoric acid, an ammonium-based compound, at least one of hydrochloric acid or a polyphosphate-based compound, and a silicon-containing compound.
Search Results
1
records
(took 0.019 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
